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Block Copolymer Self-assembly on Ethylene Glycol (EG) Self-assembled Monolayer (SAM) for Nanofabrication

Published online by Cambridge University Press:  20 July 2012

Dipu Borah
Affiliation:
Department of Chemistry, University College Cork, College Road, Cork, Ireland Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
Sozaraj Rasappa
Affiliation:
Department of Chemistry, University College Cork, College Road, Cork, Ireland Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
Barbara Kosmala
Affiliation:
Department of Chemistry, University College Cork, College Road, Cork, Ireland Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland
Justin D. Holmes
Affiliation:
Department of Chemistry, University College Cork, College Road, Cork, Ireland Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
Michael A. Morris*
Affiliation:
Department of Chemistry, University College Cork, College Road, Cork, Ireland Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
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Abstract

Nanostructure templates fabrication from P(S-b-MMA) thin films requires precise control of interfacial energies to achieve perpendicular orientation of microdomains to the substrate surface and can be obtained by modifying the oxide layer on silicon with a covalently anchored hydroxyl-terminated random copolymer P(S-r-MMA) termed a “neutral brush”. This commonly employed method enables precise fine-tuning of interfacial energies, but involves a lengthy process, requires starting materials that are commercially available but expensive, and results in a relatively thick under layer that can interfere with subsequent surface processing. We report here the microphase separation behaviour of an asymmetric P(S-b-MMA) diblock copolymer on electronic substrates modified with ethylene glycol (EG) self-assembled monolayer (SAM) as alternative to standard random copolymer brush. The diblock copolymer films deposited on EG SAMs upon thermal annealing spontaneously generates features with sub-lithographic resolution and pitch with perpendicular orientation. Selective etching provides a rapid route for the generation of PS template structures as the PMMA domains are etched at a faster rate. These templates can subsequently be used as etch masks to generate nanoscale features. We use state of the art lithography to generate sub-μm features and within these generate nm sized copolymer templates. Graphoepitaxy method proved a successful approach for the alignment of the microphase separated structures. This method of EG SAM driven self-0assembly provides a simple, rapid, yet tuneable approach for surface neutralization and nanofabrication technique for creating high density nanoscale features for the nanoelectronic industry.

Type
Articles
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

1. Lazzari, M., Lopez-Quintela, M. A., AdV. Mater. 15, 1583 (2003).Google Scholar
2. Thurn-Albrecht, T., Steiner, R., DeRouchey, J., Stafford, C. M., Huang, E., Bal, M., Tuominen, M., Hawker, C. J., Russell, T. P., AdV. Mater. 12, 787 (2000).Google Scholar
3. Guarini, K. W., Black, C. T., Yeuing, S. H. I., AdV. Mater. 14, 1290 (2002).Google Scholar
4. Black, C. T., Guarini, K. W., Milkove, K. R., Baker, S. M., Russell, T. P., Tuominen, M. T., Appl. Phys. Lett. 79, 409 (2001).Google Scholar
5. Shin, K., Leach, K. A., Goldbach, J. T., Kim, D. H., Jho, J. Y., Tuominen, M., Hawker, C. J., Russell, T. P., Nano Lett. 2, 933 (2002).Google Scholar
6. Liu, K., Baker, S. M., Tuominen, M., Russell, T. P., Schuller, I. K., Phys. ReV. B 63, 060403 (2001).Google Scholar
7. Montero, M. I., Liu, K., Stoll, O. M., Hoffmann, A., Akermann, J. J., Martin, J. I., Vicent, J. L., Baker, S. M., Russell, T. P., Leighton, C., Nogues, J., Schuller, I. K., J. Phys. D: Appl. Phys. 35, 2398 (2002).Google Scholar
8. Mansky, P., Liu, Y., Huang, E., Russell, T. P., Hawker, C. J., Science 275, 1458 (1997).Google Scholar
9. Huang, E., Russell, T. P., Harrison, C., Chaikin, P. M., Register, R. A., Hawker, C. J., Mays, J., Macromolecules 31, 7641 (1998).Google Scholar
10. Darling, S. B., Surface Science 601, 2555 (2007).Google Scholar