Article contents
Beam Processing in Silicon Device Technology
Published online by Cambridge University Press: 15 February 2011
Abstract
Three modes of beam processing are distinguished, characterised by the heat pulse duration. The suitability of each of these modes as a process step in integrated circuit fabrication is discussed with reference to six criteria for applicability. Some conclusions are made as to the eventual application of each mode of processing.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1981
References
REFERENCES
- 6
- Cited by