Published online by Cambridge University Press: 10 February 2011
The process of defect formation and the threshold energies for Si and C displacements along various crystallographic directions in cubic silicon carbide (β-SiC) have been examined using molecular dynamics simulations. A combination of Tersoff and first-principles potentials was used to model the inter-atomic interactions. The lowest threshold energies for C and Si displacements were found to be 28 and 36 eV, respectively. These displacement threshold energies show excellent agreement with the results of recent first-principles calculations in SiC and with experimental observations. Simulation of a 10 keV Si cascade yielded values of about 0.1 ps for the cascade lifetime and about 3.5 for the ratio of the number of surviving C defects to Si defects. Anti-site defects were found on both Si and C sublattices. These defects may play an important role in the amorphization of SiC by energetic particle irradiation.