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Atomistic modeling of alloy self-growth by vapor deposition: Ni and Al on NiAl(110)
Published online by Cambridge University Press: 17 May 2012
Abstract
A multisite lattice-gas (msLG) model with realistic and precise surface diffusion kinetics is applied to provide a reliable description of the initial stages of non-equilibrium self-growth of a NiAl alloy by simultaneous stoichiometric codeposition of Ni and Al on the NiAl(110) surface. Deposition at 300 K produces intermixing but poor alloy ordering. Increasing temperature enhances alloy ordering to near perfection at 600 K, but island shapes remain un-equilibrated.
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 1411: Symposium EE – Self Organization and Nanoscale Pattern Formation , 2012 , mrsf11-1411-ee10-03
- Copyright
- Copyright © Materials Research Society 2012