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Atomic Sites of Isolated 111In Atoms After Low Energy Deposition on Stepped Cu(100) Surfaces
Published online by Cambridge University Press: 15 February 2011
Abstract
We deposited low-energy 111 atoms on a vicinal Cu(100) surface at 82K, and measured the atomic sites by means of the perturbed angular correlations technique (PAC). The sites of the as-deposited In atoms were determined for deposition energies ranging from 5 to 100 eV. The results are coinpared to Molecular Dynamics simulations of the deposition process.
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- Copyright © Materials Research Society 1997