Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-29T09:56:48.506Z Has data issue: false hasContentIssue false

Atomic Scale Engineering of SrTiO3 Single Crystal Surfaces and Bicrystal Boundaries for Epitaxial Growth of Oxide Thin Films

Published online by Cambridge University Press:  15 February 2011

Q. D. Jiang
Affiliation:
Texas Center for Superconductivity, University of Houston, Houston, TX 77204, U.S.A.
J. Zegenhagen
Affiliation:
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
Get access

Abstract

We introduce a new annealing procedure to prepare well defined surfaces of SrTiO3 single crystal and bicrystal substrates. Annealing SrTiO3 (001) substrates in oxygen and then in ultra high vacuum produces a uniformly TiO2-terminated, atomically flat and ordered SrTiO3 (001) surfaces, as revealed by Auger electron spectroscopy, low energy electron diffraction, and high resolution scanning tunneling microscopy. Applying this annealing procedure to slightly off-cut (∼1.2°) SrTiO3 (001) surfaces has a strong influence on the resulting step structure. Particular annealing procedures can be used to tailor the structure and morphology of the surface and of bicrystal boundaries down to the atomic level. For example, steps of SrTiO3 (001) surfaces can be adjusted to a height of one, two, or multiple times the unit-cell size of STO (aSTO=0.3905 nm). Atomically flat SrTiO3 (001) substrates were used for deposition of SmBa2Cu3O7-δ (SBCO) thin films. The thickness (in a range from 10 nm to 200 nm) dependency of the surface morphology of SmBa2Cu3O7-δ films was investigated with UHV-STM. No spiral growth was observed. Surfaces of all films exhibit stacks of flat terraces which are frequently separated by steps, smaller than the c-axis length cSBCO of SBCO (cSBCO=1.17 nm).

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] See, for example, Epitaxial Oxide Thin Films II, edited by Speck, James S., Fork, David K., Wolf, Ronald M., Shiosaki, Tadashi, (Mat. Res. Soc. Symp. Proc., 401, Pittsburgh, PA, 1996).Google Scholar
[2] Wasa, K., Sato, T., Adachi, H., Setsune, K., Trolier-Mckinstry, S., and Schlom, D. G., (Mat. Res. Soc. Symp. Proc., 401, Pittsburgh, PA, 1996), pp. 151.Google Scholar
[3] Theis, C. D. and Schlom, D. G.., (Mat. Res. Soc. Symp. Proc., 401, Pittsburgh, PA, 1996), pp. 171.Google Scholar
[4] Lowndes, D. H., Zheng, X. -Y, Zhu, Shen, Budai, J. D., Warmack, R. J., Appl. Phys. Lett, 61, 852(1992).Google Scholar
[5] Schlom, D. G., Anselmetti, D., Bednorz, J. G., Broom, R. F., Catana, A., Frey, T., Gerber, Ch., Guntherodt, H. J., Lang, H. P. and Mannhart, J., Z: Phys., B 86, 163 (1992).Google Scholar
[6] Karl, H. and Stritzker, B., Phys. Rev. Lett., 69, 2939 (1992).Google Scholar
[7] Gong, J. P., Kawasaki, M., Fujito, K., Tsuchiya, R., Yoshimoto, M., and Koinuma, H., Jpn J. Appl. Phys., 33, L20 (1994).Google Scholar
[8] Haage, T., Li, J. Q., Leibold, B., Cardona, M., Zegenhagen, J., Habermeier, H.-U, Forkl, A., Jooss, Ch., Warthmann, R., and Kronmüller, H., Solid State Commun., 99, 553 (1996).Google Scholar
[9] Jiang, Q. D. and Zegenhagen, J., Surf. Sci., 367, L42 (1996).Google Scholar
[10] Jiang, Q. D., Smilgies, D.-M, Feidenhans'l, R., Cardona, M., and Zegenhagen, J., Solid State Commun., 98, 157 (1996).Google Scholar
[11] Henrich, V. E., Dresselhaus, G., and Zeiger, H. J., Phys. Rev., B17 4908 (1978).Google Scholar
[12] Jiang, Q. D., Pan, X. Q., and Zegenhagen, J., To be published.Google Scholar
[13] Zegenhagen, J., Siegrist, T., Fontes, E., Berman, L. E. and Patel, J. R., Solid State Commun., 93, 763 (1995).Google Scholar
[14] Jiang, Q. D. and Zegenhagen, J., Surf. Sci., 338, L882 (1995).Google Scholar
[15] Haage, T., Jiang, Q. D., Cardona, M., Habermeier, H.-U., and Zegenhagen, J., Appl. phys. Lett., 68, 2427 (1996).Google Scholar