Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-29T09:55:07.852Z Has data issue: false hasContentIssue false

Atomic Oxygen Plasma Effects on CVD Deposited Diamond-Like Carbon Films*

Published online by Cambridge University Press:  28 February 2011

Jeffrey S. Hale
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska - Lincoln, Lincoln, NE, 68588 – 0511.
R. A. Synowicki
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska - Lincoln, Lincoln, NE, 68588 – 0511.
S. Nails
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska - Lincoln, Lincoln, NE, 68588 – 0511.
John A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska - Lincoln, Lincoln, NE, 68588 – 0511.
Get access

Abstract

CVD deposited diamond-like carbon (DLC) films have been studied for possible use as a secondary standard for Low Earth Orbit materials degradation. Samples of various thicknesses have been exposed to a simulated Low Earth Orbit atomic oxygen (AO) environment using a plasma asher. Mass loss measurements indicate that DLC degrades at a rate of 0.7 mg/hr which is two to three times the rate of currently used Kapton samples which degrade at a rate of.3 mg/hr. Thickness measurements show that DLC thins at a rate of 77 Angstroms/min. Since DLC is not as susceptible to environmental factors such as moisture absorption, it could potentially provide more accurate measurements of AO fluence on short space flights. Adhesion of DLC films to both fused silica and crystalline silicon substrates has been studied under thermal cycling conditions. Film adhesion to fused silica can be enhanced by sputtering a thin layer of silicon dioxide onto the substrate prior to deposition. In addition to the above, the index of refraction and extinction coefficient of various thicknesses of DLC films has been characterized by Variable Angle Spectroscopic Ellipsometry.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

*

Research supported by NASA Lewis Research Center Grant NAG-3–95.

References

REFERENCES

1. Srinivasan, V. and Banks, B.A., Materials Degradation in Low Earth Orbit (LEO). Minerals, Metals, and Materials Society, Warrendale, PA, 1990.Google Scholar
2. Rutledge, Sharon, Banks, Bruce, DiFilippo, Frank, Brady, Joyce, Dever, Therese, and Hotes, Deborah, “An Evaluation of Candidate Oxidation Resistant materials for Space Applications in LEO,” NASA TM-100122, November 1986.Google Scholar
3. Woollam, J.A., and Snyder, P.G., “Fundamentals and Applications of Variable Angle Spectroscopic Ellipsometry,” Mat. Sci. Eng., B5, 279, (1990).Google Scholar
4. Alterovitz, Samuel A., Woollam, John A., and Snyder, Paul G., “Variable Angle Spectroscopic Ellipsometry,” Solid State Technology, 31, 99 (1988).Google Scholar
5. Azzam, R.M.A. and Bashara, N.M., Ellipsometry and Polarized Light, North Holland Publishing, New York, 1977.Google Scholar