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Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes

Published online by Cambridge University Press:  01 February 2011

Andrew S. Cavanagh ,
Christopher A. Wilson ,
Alan W. Weimer  and
Steven M. George
Andrew S. Cavanagh
Affiliation:
[email protected], University of Colorado, Dept. of Physics, Boulder, CO, 80309, United States
Christopher A. Wilson
Affiliation:
[email protected], University of Colorado, Dept. of Chemistry and Biochemistry, Boulder, CO, 80309, United States
Alan W. Weimer
Affiliation:
[email protected], University of Colorado, Dept. of Chemical and Biological Engineering, Boulder, CO, 80309, United States
Steven M. George
Affiliation:
[email protected], University of Colorado, Dept. of Chemistry and Biochemistry, Boulder, CO, 80309, United States
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Abstract

Atomic layer deposition (ALD) was performed on quantities of multiwalled carbon nanotubes (MWCNTs) in a rotary reactor. Because of nucleation difficulties, Al2O3 ALD grew as nanospheres on the MWCNTs. After a NO2 nucleation treatment, Al2O3 ALD films grew conformally and noncovalently functionalized the surface of the MWCNT. This Al2O3 ALD film served as a platform for the growth of W ALD metal. The uncoated and ALD-coated MWCNTs were characterized with transmission electron microscopy and x-ray photoelectron spectroscopy. This study demonstrates that ALD can be performed on quantities of very high surface area MWCNT substrates.

Keywords

atomic layer depositionnanostructuretransmission electron microscopy (TEM)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1054: Symposium FF – Synthesis and Surface Engineering of Three-Dimensional Nanostructures , 2007 , 1054-FF03-10
Copyright
Copyright © Materials Research Society 2008

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