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Atomic Imaging of Metal-Semiconductor Surfaces Using UHV-Hrem and Diffraction

Published online by Cambridge University Press:  21 February 2011

L. D. Marks ,
G. Jayaram ,
R. Plass  and
N. Doraiswamy
L. D. Marks
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
G. Jayaram
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
R. Plass
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
N. Doraiswamy
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
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Abstract

Recent results about the atomic scale structure of pristine and metal covered, clean semiconductor surfaces using high resolution electron microscopy (HREM) and electron diffraction under ultrahigh vacuum (UHV) conditions are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 181
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1. Ikarashi, N., Kobayashi, K., Koike, H., Hasegawa, H. and Yagi, K., Ultramicroscopy 26, 195 (1984).Google Scholar
2. Takayanagi, K., Tanishiro, Y., Takahashi, S., and Takahashi, M., Surf. Sci. 164, 367 (1985).Google Scholar
3. Hana, Y. and Takayanagi, K., Ultramicroscopy 45, 95 (1992).Google Scholar
4. Marks, L. D., Phys. Rev. Lett. 51, 1000 (1983).Google Scholar
5. Gibson, J. M., McDonald, M. L. and Unterwald, F. C., Phys. Rev. Lett. 55, 1765 (1985).Google Scholar
6. Lu, P. and Smith, D. J., Phys. Rev. Lett. 59, 2177 (1987).Google Scholar
7. Xu, P. and Marks, L. D., Ultramicroscopy 45, 155 (1992).Google Scholar
8. Andrews, H. C. and Hunt, B. R., Digital Image Restoration, 1st ed. (Prentice-Hall Inc., New Jersey, 1977)Google Scholar
9. Schiske, P., in Image Processing and Computer-aided Design in Electron Optics, edited by Hawkes, P. W. (Academic Press, London and New York, 1973) p. 82.Google Scholar
10. Marks, L. D., Xu, P. and Dunn, D. N., Surf. Sci. 294, 322 (1993).Google Scholar
11. Marks, L. D., Xu, P., Dunn, D. N. and Zhang, J. P., EMSA Bulletin 22: 3, 65 (1992).Google Scholar
12. Takayanagi, K. et al, Surf. Sci. 164, 367 (1985).Google Scholar
13. Gibson, J. M., Surf. Sci. Lett. 239, L531 (1990).Google Scholar
14. Marks, L. D., Ultramicroscopy 45, 145 (1992).Google Scholar
15. Jayaram, G., Xu, P. and Marks, L. D., Phys. Rev. Lett. 71, 3489 (1993).Google Scholar
16. Schlier, R. E. and Farnsworth, H. E., J. Chem. Phys 30, 917 (1959).Google Scholar
17. Yin, M. T. and Cohen, M. L., Phys. Rev. B 24, 2303 (1978).Google Scholar
18. Roberts, N. and Needs, R. J., Surf. Sci. 236, 112 (1990).Google Scholar
19. Artacho, E. and Yndurain, F., Phys. Rev. Lett. 62, 2491 (1989).Google Scholar
20. Batra, I. P., Phys. Rev. B 41, 5048 (1990).Google Scholar
21. Tromp, R. M., Hamers, R. J. and Demuth, J. E., Phys. Rev. Lett. 55, 1303 (1985).Google Scholar
22. Hamers, R. J., Tromp, R. M. and Demuth, J. E., Phys. Rev. B 34, 5343 (1986).Google Scholar
23. Wolkow, R. A., Phys. Rev. Lett. 68, 2636 (1992).Google Scholar
24. Chester, M. and Gustafsson, T., Surf. Sci. 256 (1991) 135.Google Scholar
25. Nogami, J., Baski, A.A., and Quate, C.F., Phys. Rev. Let. 65 (1990) 1611.Google Scholar
26. Ding, Y.G., Chan, C.T., and Ho, K.M., Surf. Sci. Let. 275 (1992) L691.Google Scholar
27. Oura, K., Katayama, M., Shoji, F., and Hanawa, T., Phys. Rev. Let. 55 (1985) 1486.Google Scholar
28. Dornisch, D. et al, Phys. Rev. B 44 (1992) 11221.Google Scholar
29. Quinn, J., Jona, F., and Marcus, P. M., Phys. Rev. B 46 (1992) 7288.Google Scholar
30. O'Mahoney, J. D. et al, Surf. Sci. Let. 277 L57 (1992).Google Scholar
31. Schamper, C.H. et al, Phys. Rev. B 43 12130 (1991).Google Scholar
32. Samsavar, A. et al., Phys. Rev. Lett. 63, 2830 (1989).Google Scholar
33. Hashizume, T. et al, J. Vac. Sci. Tech. A 8, 249 (1990).Google Scholar
34. Brodde, A. et al., J. Vac. Sci. Tech. A 8, 251 (1990).Google Scholar
35. Lin, X. F., Wan, K. J. and Nogami, J., Phys. Rev. B 47, 10947 (1993).Google Scholar
36. Hanbücken, M., Futamoto, M. and Venables, J. A., Surf. Sci. 147, 433 (1984).Google Scholar
37. Hanbücken, M. and LeLay, G., Surf. Sci. 168, 122 (1986).Google Scholar
38. Borensztein, Y. and Alameh, R., Appl. Surf. Sci. 65/66, 735 (1993).Google Scholar
39. Nishimori, K. et al, Surf. Sci. 242, 157 (1991).Google Scholar
40. Kimura, Y. and Takayanagi, K., Surf. Sci. 276, 166 (1992).Google Scholar
41. Luo, F. C. H., Hembree, G. G. and Venables, J. A., in Proceedings of the Materials Research Society, edited by Thompson, C. V., Tsao, J. Y. and Srolovitz, D. J., 202, 49 (1991).Google Scholar
42. Shirokoff, J. and Erb, U., Phil. Mag. Lett. 58, 255 (1988).Google Scholar
43. Ino, S., J. Phys. Soc. Japan 21, 346 (1966).Google Scholar
44. Marks, L. D. and Smith, D. J., J. Cryst. Growth 54, 425 (1981).Google Scholar
45. Buffat, P. A. et al, Faraday Discussions 92, 173 (1991).Google Scholar
46. Kirkland, A. I. et al, Proc. Royal Soc. London A 34, 279 (1991).Google Scholar
47. Gillet, M., Surf. Sci. 67, 139 (1977).Google Scholar
48. Renou, A. and Rudra, A., Surf. Sci. 156, 69 (1985).Google Scholar
49. Altenhein, C. et al, Z. Phys. D 19, 303 (1991).Google Scholar
50. Hofmeister, H., Z. Phys. D 19, 307 (1991).Google Scholar
51. Allpress, J. G. and Sanders, J. V., Surf. Sci. 7, 1 (1967).Google Scholar
52. Ino, S., J. Phys. Soc. Japan 27, 941 (1969).Google Scholar
53. Marks, L. D., Phil. Mag. A 49, 81 (1984).Google Scholar
54. Howie, A. and Marks, L. D., Phil. Mag. A 49, 95 (1984).Google Scholar
55. Ajayan, P. M. and Marks, L. D., Phase Transitions 24, 229 (1990).Google Scholar
56. Cleveland, C. and Landman, U., J. Chem. Phys. 94, 7376 (1991).Google Scholar
57. Hall, B. D. et al, Phys. Rev. B 43, 3906 (1991).Google Scholar
58. Honjo, G. et al, Phys. Stat. Sol. A 55, 353 (1979).Google Scholar
59. Marks, L. D., Thin Solid Films 136, 309 (1986).Google Scholar
60. Marks, L. D., Rep. Prog. Phys. 57, 533 (1994).Google Scholar
61. Weitering, H. H. et al, Appl. Surf. Sci. 70/71, 422 (1993).Google Scholar