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The Application of Optical Interferometry to the Study of Field-Induced Effects in Bulk and thin Film Ferroelectrics

Published online by Cambridge University Press:  21 February 2011

Keith L Lewis  and
Kathleen F Dexter
Keith L Lewis
Affiliation:
Defence Research Agency, St Andrews Road, Malvern, Worcs. WRI4 3PS, UK
Kathleen F Dexter
Affiliation:
Defence Research Agency, St Andrews Road, Malvern, Worcs. WRI4 3PS, UK
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Abstract

A study is reported of field-induced effects in ferroelectric materials using optical interferometry. One of the techniques used is based on the use of a WYKO TOPO3 system and provides a three dimensional representation of field-induced displacement. The information provided is supplemented by optical transmission measurements on thin sections of material fabricated to allow interference fringing to be seen. Initial work has centred on the characterisation of ceramic PLZT material. Both transverse and longitudinal electrode configurations have been studied and have highlighted the magnitude of the effects possible and the importance of electrostrictive processes in determining the direction of deformation. These can result in anomalously high strain gradients over distances of the order of 50-100µm. This behaviour is compared with that found for preliminary samples of thin film ferroelectric materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 310: Symposium N – Ferroelectric Thin Films III , 1993 , 99
Copyright
Copyright © Materials Research Society 1993

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References

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