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Application of Ftir Spectroscopy to the Characterization of as-Deposited and Chemical Mechanical Polished (CMP) Electron Cyclotron Resonance (ECR) Plasma Based SiO2 Films

Published online by Cambridge University Press:  22 February 2011

Mukesh Desai ,
Ron Carpio ,
Rahul Jairath ,
Matt Stell  and
Robert Tolles
Mukesh Desai
Affiliation:
On assignment from IBM Corporation, SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741
Rahul Jairath
Affiliation:
On assignment from National Semiconductor Corporation, SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741
Matt Stell
Affiliation:
On assignment from Digital Equipment Corporation SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741
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Abstract

FTIR spectroscopy has been used to characterize as-deposited and chemical mechanical polished (CMP) electron cyclotron resonance (ECR) plasma based SiOx films. The ECR films were deposited at different O2/SiH4 gas ratios in an attempt to vary the film stochiometry. Transmission and reflectance-absorbance IR spectral data were combined with CMP removal rate information to characterize the SiOx films and their polishing behavior. The asymmetric O-Si-O stretching (ASM) and Si-OH vibrational bands were found to be principal sources of information.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 324: Symposium K – Diagnostic Techniques for Semiconductor Materials Processing , 1993 , 249
Copyright
Copyright © Materials Research Society 1994

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