Hostname: page-component-cd9895bd7-gbm5v Total loading time: 0 Render date: 2024-12-24T02:53:48.042Z Has data issue: false hasContentIssue false
  • English
  • Français

Application of Cylinder Forming Block Copolymers as Templates for Formation of Bit Patterned and Graded Media

Published online by Cambridge University Press:  26 February 2011

Vishal Warke ,
Martin Gerard Bakker ,
Kunlun Hong ,
Jimmy Mays  and
Phillip Britt
Vishal Warke
Affiliation:
[email protected], The University of Alabama, Center for Materials for Information Technologies, Tuscaloosa, AL, 35487-0209, United States
Martin Gerard Bakker
Affiliation:
[email protected], The University of Alabama, Center for Materials for Information Technologies, Tuscaloosa, AL, 35487-0209, United States
Kunlun Hong
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Jimmy Mays
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Phillip Britt
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Get access

Abstract

Bit patterned media, including media fabricated with a gradient in composition, is being developed as a potential path to higher information storage density. The formation of metal nanopillars with 20-30 nm repeat spacing and precisely controlled magnetic properties presents a significant challenge to current fabrication methods. We have been developing cylinder forming block copolymer phases as a method to generate the desired patterns coupled with the processing steps necessary to transfer the pattern into magnetic material. This involves spin coating of the polymer on an appropriate orienting layer, annealing to allow the pattern to form by self-organization of the block copolymer, solvent processing to remove the minority domain, electrodeposition to form a hard mask, followed by ion-milling to transfer the pattern to the magnetic material. We have demonstrated each step in this process and report on the quality of the pattern achieved.

Keywords

magneticself-assemblypolymer
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1032: Symposium I – Nanoscale Magnetic Materials and Applications , 2007 , 1032-I05-04
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Thurn-Albrecht, T., Schotter, J., Kastle, G.A., Emley, N., Shibauchi, T., Krusin-Elbaum, L., Guarini, K., Black, C.T., Tuominen, M.T., and Russell, T.P., Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. Science 2000. 290(5499): p. 2126–2129.10.1126/science.290.5499.2126Google Scholar
2. Misner, M.J., Skaff, H., Emrick, T., and Russell, T.P., Directed deposition of nanoparticles using diblock copolymer templates. Adv. Mater., 2003. 15(3): p. 221–224.10.1002/adma.200390050Google Scholar
3. Lu, J.Q. and Yi, S.S., Uniformly sized gold nanoparticles derived from PS-b-P2VP block copolymer templates for the controllable synthesis of i nanowires. Langmuir, 2006 22(9): p. 3951–3954.10.1021/la053377xGoogle Scholar
4. Crossland, E.J.W., Ludwigs, S., Hillmyer, M.A., and Steiner, U., Freestanding nanowire arrays from soft-etch block copolymer templates. Soft Matter, 2007. 3(1): p. 94–98.10.1039/B609780DGoogle Scholar
5. Minelli, C., Hinderling, C., Heinzelmann, H., Pugin, R., and Liley, M., Micrometer-long gold nanowires fabricated using block copolymer templates. Langmuir, 2005. 21(16): p. 7080–7082.10.1021/la050757+Google Scholar
6. Choi, D.-G., Jeong, J.-R., Kwon, K.-Y., Jung, H.-T., Shin, S.-C., and Yang, S.-M., Magnetic nanodot arrays patterned by selective ion etching using block copolymer templates. Nanotechnology, 2004. 15(8): p. 970–974.10.1088/0957-4484/15/8/018Google Scholar
7. Zschech, D., Kim, D.H., Milenin, A.P., Scholz, R., Hillebrand, R., Hawker, C.J., Russell, T.P., Steinhart, M., and Goesele, U., Ordered Arrays of {100}-Oriented Silicon Nanorods by CMOS-Compatible Block Copolymer Lithography. Nano Lett., 2007. 7(6): p. 1516–1520.10.1021/nl070275dGoogle Scholar
8. Bates, F.S. and Fredrickson, G.H., Block Copolymer Thermodynamics: Theory and Experiment. Annual Reviews, 1990. 41(1): p. 525–557.10.1146/annurev.pc.41.100190.002521Google Scholar
9. Bates, F.S. and Fredrickson, G.H., Block copolymers--designer soft materials. Physics Today, 1999. 52(2): p. 32–38.10.1063/1.882522Google Scholar
10. Leibler, L., Theory of Microphase Separation in Block Copolymers. Macromolecules 1980. 13(6): p. 1602–1617.10.1021/ma60078a047Google Scholar
11. Matsen, M.W. and Bates, F.S., Unifying weak-and strong-segregation block copolymer theories. Macromolecules, 1996. 29(4): p. 1091–1098.10.1021/ma951138iGoogle Scholar
12. Mansky, P., Liu, Y., Huang, E., Russell, T.P., and Hawker, C., Controlling Polymer-Surface Interactions with Random Copolymer Brushes. Science, 1997. 275(5305): p. 1458–1460.10.1126/science.275.5305.1458Google Scholar
13. Park, D.H., The fabrication of thin films with nanopores and nanogrooves from block copolymer thin films on the neutral surface of self-assembled monolayers. Nanotechnology, 2007. 18(355304): p. 355304.10.1088/0957-4484/18/35/355304Google Scholar
14. Thurn-Albrecht, T., Steiner, R., DeRouchey, J., Stafford, C.M., Huang, E., Bal, M., Tuominen, M., Hawker, C.J., and Russell, T.P., Nanoscopic templates from oriented block copolymer films. Advanced Materials, 2000. 12(11): p. 787–790.10.1002/(SICI)1521-4095(200006)12:11<787::AID-ADMA787>3.0.CO;2-13.0.CO;2-1>Google Scholar
15. Fukunaga, K., Elbs, H., Magerle, R., and Krausch, G., Large-Scale Alignment of ABC Block Copolymer Microdomains via Solvent Vapor Treatment. Macromolecules, 2000. 33(3): p. 947–953.10.1021/ma9910639Google Scholar
16. Kim, S.H., Misner, M.J., Xu, T., Kimura, M., and Russell, T.P., Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation. Advanced Materials, 2004. 16(3): p. 226–231.Google Scholar
17. Angelescu, D. E., Waller, J. H, Adamson, D. H, Deshpande, P., Chou, S. Y, Register, R. A, and Chaikin, P.M., Macroscopic Orientation of Block Copolymer Cylinders in Single-Layer Films by Shearing. Advanced Materials, 2004. 16(19): p. 1736–1740.10.1002/adma.200400643Google Scholar
18. Warke, Vishal, Redden, Chris, Bakker, Martin G., Nikles, David E., Hong, Kunlun, Mays, J., and Britt, P., Development of Block Co-Polymers as Self-Assembling Templates for Magnetic Media and Spin–Valves. Mater. Res. Soc. Symp. Proc., 2006. 941: p. Q06–10.10.1557/PROC-0941-Q06-10Google Scholar
19. Warke, Vishal, Curry, Michael L., Bakker, M. G., Hong, Kunlun, Mays, Jimmy, Britt, Phillip, Li, Xuefa, and Wang, J., Development of Block Co-Polymers as Self-Assembling Templates for Patterned Media. Mater. Res. Soc. Symp. Proc., 2006. 961: p. O01–07.10.1557/PROC-0961-O01-07Google Scholar