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An Improved Tool for Wedge-Polishing of Materials for Tem

Published online by Cambridge University Press:  10 February 2011

F. Shaapur  and
J. Rimer
F. Shaapur
Affiliation:
NanoTEM, Inc., UltraMetrix Division, 7620 E. McKellips Rd., No. 4109, Scottsdale, AZ 85257
J. Rimer
Affiliation:
NanoTEM, Inc., UltraMetrix Division, 7620 E. McKellips Rd., No. 4109, Scottsdale, AZ 85257
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Abstract

A new and improved commercial version of a tool designed originally for angle-lapping to electron-transparency has been presented in this paper. The new tool commercially known as precision angle lapper (PALTM) was originally developed and introduced in 1995. The improvements incorporated in the PAL design were conceived and implemented mainly as a result of a systematic analysis of the original tool design, the shortcomings and complications encountered during the routine hands-on use of it, requirements for major auxiliary equipment in conjunction with application of the tool and, finally, the input from other users of the tool. The basis for each added and/or improved feature of the PAL has been individually discussed and the resulting advantages have been reviewed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 480: Symposium Z – Specimen Preparation for Transmission Electron Microscopy…IV , 1997 , 181
Copyright
Copyright © Materials Research Society 1997

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References

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