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An Atomic Force Microscopy Study of the Initial Nucleation of GaN on Sapphire

Published online by Cambridge University Press:  21 February 2011

M. Richards-Babb
Affiliation:
Chemistry Department
S. L. Buczkowski
Affiliation:
Physics Department, West Virginia University, Morgantown, WV 26506, [email protected]
Zhonghai Yu
Affiliation:
Physics Department, West Virginia University, Morgantown, WV 26506, [email protected]
T. H. Myers
Affiliation:
Physics Department, West Virginia University, Morgantown, WV 26506, [email protected]
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Abstract

Preliminary results of a study of GaN nucleation and growth by molecular beam epitaxy using a nitrogen rf plasma source are presented. Nucleation layers and 3000 Å thick layers were investigated by atomic force microscopy and x-ray diffraction. Growth under gallium-rich conditions both increased nucleation island size and promoted two-dimensional growth.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 See, for example, Pankove, J., Mater. Res. Soc. Symp. Proc. 97, 409 (1987).Google Scholar
2 Moustakas, T. D., Lei, T., and Molnar, R. J., Physica B 185, 36 (1993).Google Scholar
3 Qian, W., Skowronski, M., DeGraef, M., Doverspike, K., Rowland, L. B., and Gaskill, D. K., Appl. Phys. Lett. 66, 1252 (1995).Google Scholar
4 Lester, S. D., Ponce, F. A., Crafford, M. G., and Steigerwald, D. A., Appl. Phys. Lett. 66, 1249 (1995).Google Scholar
5 Amano, H., Sawaki, N., Asaki, I., and Toyoda, Y., Appl. Phys. Lett. 48, 353 (1986).Google Scholar
6 Nakamura, S., Jpn. J. Appl. Phys. 30, 1705 (1991).Google Scholar
7 Kuznia, J. N., Asif Khan, M., Olson, D. T., Kaplan, R., and Freitas, J., J. Appl. Phys. 73, 4700 (1993).Google Scholar
8 Sitar, Z., Smith, L. L., and Davis, R. F., J. Cryst. Growth 141, 11 (1994).Google Scholar
9 Kapolnek, D., Wu, X. H., Heying, B., Keller, S., Keller, B. P., Mishra, U. K., DenBaars, S. P., and Speck, J. S., Appl. Phys. Lett. 67, 1541 (1995).Google Scholar
10 Myers, T. H., Yanka, R. W., Harris, K. A., Reisinger, A. R., Han, J., Hwang, S., Yang, Z., Giles, N. C., Cook, J. W. Jr., Schetzina, J. F., Green, R. W. and McDevitt, S., J. Vac. Sci. Technol. A7, 300(1989)Google Scholar
11 Weeks, T. W. Jr., Bremser, M. D., Ailey, K. S., Carlson, E., Perry, W.G, and Davis, R. F., Appl. Phys. Lett. 67, 401 (1995).Google Scholar
12 Lin, M. E., Sverdlov, B. N., and Morkç, H., J. Appl. Phys. 74, 5038 (1993).Google Scholar