Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-29T07:42:28.887Z Has data issue: false hasContentIssue false

An Arxps Investigation of the Initial Growth of Aluminum Films on the (0001) Face of Sapphire.

Published online by Cambridge University Press:  22 February 2011

Mehran Arbab
Affiliation:
Case Western Reserve University, Department of Materials Science and Engineering, Clevelard, OH 44106 PPG Industries, Inc., Glass Research & Development Center, Pittsburgh, PA 15238–0472.
Gary S. Chottiner
Affiliation:
Case Western Reserve University, Department of Physics, Cleveland, OH 44106
R. W. Hoffman
Affiliation:
Case Western Reserve University, Department of Physics, Cleveland, OH 44106
Get access

Abstract

The (0001) face of α-Al2O3 and the initial growth of ultra-thin aluminum, films deposited on this surface were studied by a combination of low energy electron diffraction, angle resolved x-ray photoelectron spectroscopy and thermal desorption techniques. At high temperatures, the (0001) face of α-Al2O3 reconstructs to form a (√31×√31)R±9° structure which remains stable at lower temperatures, as evidenced by IEED. ARXPS shows that the annealed sanple retains its bulk composition up to the solid-vacuum interface.

Thin Al films were deposited on the above surface by in situ evaporation. ARXPS results indicate a uniform growth of the initial monolayer of aluminum. Further growth (<3 A°) deviated fr the layer by layer adsorption mechanism.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Castro, V. Di and Polzonetti, G., Surf. Sci. 189/190, 1085 (1987).Google Scholar
2. Ctluchi, F.S., French, R.H., and Kasowski, R.V., J. Appl. Phys. 62, 2286 (1987).Google Scholar
3. Chen, J.G., Croll, J.E., and Yates, J.T. Jr., Surf. Sci. 185, 373 (1987).Google Scholar
4. Woodruff, D.P. and Delchar, T.A., Modern Techniques of Surface Science, (Cambridge Univ. Press, 1988).Google Scholar
5. Seah, M.P. and Dench, W.A., Surf. Interface Anal., 1, 2 (1979).Google Scholar
6. Fadley, C.S., Baird, R.J., Siekhaus, W., Novakov, T., and Bergstrxn, S.A.L, J. Elec. Spec. and Related fnen., 4, 93 (1974).Google Scholar
7. Grxundnr, M., Proc. 7th Intern. Vac. Congr. and 3rd Intern. Conf. Solid Surfaces, 2, 2237 (Vienna 1977).Google Scholar
8. Version 2.0 ESCA software, Perkin-Elmer Corp., Physical Electronics Division, Eden Prairie, Minnesota.Google Scholar
9. French, T.M. and Samorjai, G.A., J. Phys. Chem., 74, 2489 (1970).Google Scholar
10. Chang, C.C., J. Appl. Phys., 39, 5570 (1968).Google Scholar
11. Wagner, C.D., Riggs, W.M., Davis, L.E., Moulder, J.F., and Mkilenberg, G.E., Handbook of x-ray Photoelectron Spectroscopy, Perkin-Elmer Corp., Physical Electronics Division, Eden Prairie, Minnesota (1979).Google Scholar
12. Citrin, P.H., Wertheim, G.K., and Baer, Y., Phys. Rev. B, 16, 4256 (1977).Google Scholar
13. Arbab, M. and Chottiner, G.S., to be published.Google Scholar
14. Venables, J.A., Spiller, G.D.T., and Hanbucken, M., Rep. Prog. Phys., 47, 399 (1984).Google Scholar
15. FlIdstron, S.A., Martinsson, C.W.B., Bachrach, R.Z., Hagstron, S.B.M., and Bauer, R.S., Phys. Rev. Lett., 40, 907 (1978).Google Scholar