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Amplification Path Length Dependence Studies of Stimulated Emission from Optically Pumped InGaN/GaN Multiple Quantum Wells

Published online by Cambridge University Press:  15 February 2011

T.J. Schmidt
Affiliation:
Center for Laser and Photonics Research and Dept. of Physics Oklahoma State University, Stillwater, OK 74078
S. Bidnyk
Affiliation:
Center for Laser and Photonics Research and Dept. of Physics Oklahoma State University, Stillwater, OK 74078
Yong-Hoon Cho
Affiliation:
Center for Laser and Photonics Research and Dept. of Physics Oklahoma State University, Stillwater, OK 74078
A.J. Fischer
Affiliation:
Center for Laser and Photonics Research and Dept. of Physics Oklahoma State University, Stillwater, OK 74078
J.J. Song
Affiliation:
Center for Laser and Photonics Research and Dept. of Physics Oklahoma State University, Stillwater, OK 74078
S. Keller
Affiliation:
Electrical and Computer Engineering and Materials Depts. University of California, Santa Barbara, CA 93106
U.K. Mishra
Affiliation:
Electrical and Computer Engineering and Materials Depts. University of California, Santa Barbara, CA 93106
S.P. DenBaars
Affiliation:
Electrical and Computer Engineering and Materials Depts. University of California, Santa Barbara, CA 93106
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Abstract

Optically pumped stimulated emission (SE) from InGaN/GaN multiple quantum wells (MQWs) grown by metalorganic chemical vapor deposition has been systematically studied as a function of excitation length (Lexc). Two distinct SE peaks were observed from these structures: one that originates at 425 nm at 10 K (430 nm at 300 K) and another that originates at 434 nm at 10 K (438 nm at 300 K). The SE threshold for the high energy peak was observed to always be lower than that of the low energy peak, but the difference was found to decrease greatly with increasing Lexc. A detailed study of the emission intensity of these two SE peaks as a function of excitation density shows that the two peaks compete for gain in the MQW active region.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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