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Adhesion of Thin Metal Films to Vacuum-Cleaved SiO2, Al2O3, and MgO Substrates

Published online by Cambridge University Press:  22 February 2011

Andris Simanovskis ,
Sara Stolyarova  and
Silvia Varchenya
Andris Simanovskis
Affiliation:
Institute of Physics, Latvian Academy of Sciences, 229021, Riga, Salaspils, Latvia
Sara Stolyarova
Affiliation:
Institute of Physics, Latvian Academy of Sciences, 229021, Riga, Salaspils, Latvia
Silvia Varchenya
Affiliation:
Institute of Physics, Latvian Academy of Sciences, 229021, Riga, Salaspils, Latvia
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Abstract

The adhesion of Au, Ag, Pb, Sn, In, Cu, Cd, Mg, Ca films to vacuum-cleaved Al2O3, MgO and SiO2 single crystals has been studied. It is shownf -4hat for botn Al2O3 and MgO the level of adhesion is slightly higher than that for SiO2 and tends to increase with chemical activity of deposited metals. As a result, the adhesion varies from the level of van der Waals forces to the level of chemical interaction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 239: Symposium D – Thin Films: Stresses and Mechanical Properties III , 1991 , 599
Copyright
Copyright © Materials Research Society 1992

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References

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