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The Accurate Determination of Bulk Glasses and Glass Film Compositions by Inductively Coupled Plasma-Atomic Emission Spectronmtry

Published online by Cambridge University Press:  28 February 2011

T. Y. Kometani*
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Fll, NJ. 07974
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Abstract

A sequential inductivly coupled plasma-atomnic emission spectrrnetric (ICP-AES) method has been dewvloped for the cnmplete quantitative analyses of silicate glasses. B, P, Ge, and Si have been determined with 2%precisicn and accuracy in bulk glass and glass films on Si wafer substrates. Two chemical sample processing steps, dissdution in hydrofluoric acid at roam temperature and fusion in a sodium carbonate flux, were equally effective for deconposing samples without loss of volatile components. Rapid analysis for controlling glass film composition during IC process devlopment wer provided by the ICP-AES maethod. Where accurate film w~ghts were not obtainable, coatpositions wee established by complete analyses of all glass components except cxygen. The sum of the weights of components converted to their cides served as the sample weight for calculation purposes.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

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References

REFERENCES

1. Chesny, J. B. Mac, Proc. IEEE 68, 1181 (1980).Google Scholar
2. Nagal, S. R., Chesney, J. B. Mac, and Walker, K. L., IEEE J. of Quant. Elect. QE–18, 459 (1982).Google Scholar
3. Kern, W. and Hein, R. C., J. Eletrochem Soc. 117 562 and 568 (1970).CrossRefGoogle Scholar
4. Schnable, G. L., Kern, W., and Camizzoti, R. B., Elctrochem. Soc. 122, 1092 (1975).Google Scholar
5. Weissman, S. H., Proc. of SPIE – The International Society for Optical Engineering 463, 130 (1984).Google Scholar
6. Chu, P. K. Grube, S. L., Anal. Chem 57, 1071 (1985).Google Scholar
7. Tong, J. E. and Schertenleib, K., and Carpio, R. A., Solid State Techn. 161, (1984).Google Scholar
8. Wilson, C. L. and Wilson, D. W., Comprehensive AnalyticaI Chemistry, Vol. Ic, (D. Van Norstrond Co., Princeton, NJ, 1962), p. 96.Google Scholar
9. Burdo, R. A., J of Non-Cryst. Solids 38 and 39,171 (1980).CrossRefGoogle Scholar
10. Fassel, V. A., Anal. Chem. 51, 1290A (1979).Google Scholar
11. Bernas, B., Anal. Chem. 40, 1682 (1968).Google Scholar
12. Bock, R., A Handbook of Decomposition Methods in Anailytial Chemistry, Wiley, N.Y., 1979, p. 56.Google Scholar
13. Langmyhr, F. I. and Graff, P. R., Anal. Chem. Acta. 21, 334 (1959).Google Scholar
14. Morrow, R. W., Anal. Lett. 5(6), 371 (1972).Google Scholar
15. Kilroy, W. P. and Moynihan, C. T., Chem. Acta. 83, 389 (1979).Google Scholar
16. Burdo, R. A. Snyder, M. L., Anal. Chem. 51, 1502 (1979).Google Scholar
17. Riley, E. Jr and Lindstrom, R. M., J. of Radioanal. chem., to be piblished.Google Scholar