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Accumulation of Implantation Damage in MEV Implanted Diamond Crystals

Published online by Cambridge University Press:  22 February 2011

John D. Hunn
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
S.P. Withrow
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
R.E. Clausing
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
L. Heatherly
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
J. Bentley
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
D.M. Hembree Jr.
Affiliation:
Oak Ridge Y-12 Plant, Oak Ridge, Tennessee 37831
N.R. Parikh
Affiliation:
University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599
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Abstract

Single crystal, type IIa natural diamond substrates have been implanted with 4 MeV carbon ions to doses ranging from 0.5–130×1016 cm-2. The accumulation of implantation damage is studied by Raman and RBS/channeling. Similar effects are observed for crystals of [100], [110], and [111] orientation but with different rates of damage accumulation. With increasing implantation damage, the triply degenerate Raman mode at 1332 cm-1 broadens and shifts down to around 1300 cm-1. This corresponds to a peak in the one-phonon density of states as predicted for Raman from an amorphous sp3 network. There is no evidence for the existence of sp2 carbon in the implanted area. Additional non-graphite Raman peaks appear at 1451, 1494, and 1635 cm-1. At the higher doses, the 1332 cm-1 Raman mode is no longer observed; however, RBS/channeling still shows the surface region to be crystalline and it is possible to grow high quality homoepitaxial diamond films on these substrates.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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