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A 29Si-NMR Investigation of Amorphous Hydrogenated Silicon Nitride

Published online by Cambridge University Press:  28 February 2011

Mark A. Petrich ,
Rhett E. Livengood ,
Jeffrey A. Reimer  and
Dennis W. Hess
Mark A. Petrich
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720-9989.
Rhett E. Livengood
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720-9989.
Jeffrey A. Reimer
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720-9989.
Dennis W. Hess
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720-9989.
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Abstract

We present the results of a spectroscopic study of amorphous hydrogenated silicon nitride. The nitride was prepared by plasma enhanced chemical vapor deposition and was studied with infrared absorption (IR) and solid-state nuclear magnetic resonance (NMR) spectroscopies. This nitride film shows a particularly interesting distribution of hydrogen: hydrogen atoms are nearly exclusively bound to nitrogen.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 70: Symposium E – Materials Issues in Amorphous-Semiconductor Technology , 1986 , 337
Copyright
Copyright © Materials Research Society 1986

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References

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