Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Hofsäss, H.
Ronning, C.
Feldermann, H.
and
Sebastian, M.
1996.
Quantitative Analysis of Chemically-Enhanced Sputtering during Ion Beam Deposition of Carbon Nitride Thin Films.
MRS Proceedings,
Vol. 438,
Issue. ,
Tsubouchi, N.
Horino, Y.
Enders, B.
Chayahara, A.
Kinomura, A.
and
Fujii, K.
1996.
Carbon Nitride Film Formation by Low Energy Positive and Negative Ion Beam Deposition.
MRS Proceedings,
Vol. 438,
Issue. ,
Tsubouchi, N.
Horino, Y.
Enders, B.
Chayahara, A.
Kinomura, A.
and
Fujii, K.
1997.
Properties of C and CN Films Prepared by Mass-Separated Hyper-Thermal Carbon and Nitrogen Ions.
MRS Proceedings,
Vol. 504,
Issue. ,
Weich, F.
Widany, J.
and
Frauenheim, Th.
1997.
Paracyanogenlike Structures in High-Density Amorphous Carbon Nitride.
Physical Review Letters,
Vol. 78,
Issue. 17,
p.
3326.
Frauenheim, Th.
Porezag, D.
Elstner, M.
Jungnickel, G.
Elsner, J.
Haugk, M.
Sieck, A.
and
Seifert, G.
1997.
An ab initio two-center tight-binding approach to simulations of complex materials properties.
MRS Proceedings,
Vol. 491,
Issue. ,
Kühn, M
Spaeth, C
Pintaske, R
Peter, S
Richter, F
and
Anders, A
1997.
The effect of additional ion/plasma assistance in CNx-film deposition based on a filtered cathodic arc.
Thin Solid Films,
Vol. 311,
Issue. 1-2,
p.
151.
Zhao, X.-A
Ong, C.W
Tsang, Y.C
Chan, K.F
Choy, C.L
Chan, P.W
and
Kwok, R.W.M
1998.
Relationship between the structure and the optical and electrical properties of ion beam deposited CNx films.
Thin Solid Films,
Vol. 322,
Issue. 1-2,
p.
245.
Weich, F.
Widany, J.
and
Frauenheim, Th.
1999.
Paracyanogen-like structures in high-density amorphous carbon nitride.
Carbon,
Vol. 37,
Issue. 4,
p.
545.
Kulisch, W
Delplancke-Ogletree, M.P
Buliř, J
Jelı́nek, M
Jurek, K
Zemek, J
and
Klimovič, J
1999.
Characterization of magnetron sputtered carbon nitride films.
Diamond and Related Materials,
Vol. 8,
Issue. 6,
p.
1039.
Ronning, C.
Merk, R.
Feldermann, H.
Harbsmeier, F.
and
Hofsäss, H.
1999.
Properties of Ion Beam Deposited Tetrahedral Fluorinated Amorphous Carbon Films (ta-C:F).
MRS Proceedings,
Vol. 593,
Issue. ,
Spaeth, C
Kühn, M
Chudoba, T
and
Richter, F
1999.
Mechanical properties of carbon nitride thin films prepared by ion beam assisted filtered cathodic vacuum arc deposition.
Surface and Coatings Technology,
Vol. 112,
Issue. 1-3,
p.
140.
Kulisch, W
Popov, C
Zambov, L
Buliř, J
Delplancke-Ogletree, M.P
Lančok, J
and
Jelı́inek, M
2000.
Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films.
Thin Solid Films,
Vol. 377-378,
Issue. ,
p.
148.
Kurmaev, E.Z
Moewes, A
Winarski, R.P
Shamin, S.N
Ederer, D.L
Feng, J.Y
and
Turner, S.S
2002.
Characterization of CNx films by X-ray emission measurements.
Thin Solid Films,
Vol. 402,
Issue. 1-2,
p.
60.
Li, J.J.
Zheng, W.T.
Jin, Z.S.
Gai, T.X.
Gu, G.R.
Bian, H.J.
and
Hu, C.Q.
2003.
Thermal stability of magnetron sputtering amorphous carbon nitride films.
Vacuum,
Vol. 72,
Issue. 3,
p.
233.