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Nanopatterning with UV Optical Lithography

Published online by Cambridge University Press:  31 January 2011

M. Rothschild ,
T. M. Bloomstein ,
N. Efremow Jr. ,
T. H. Fedynyshyn ,
M. Fritze ,
I. Pottebaum  and
M. Switkes
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Abstract

Optical lithography at ultraviolet (UV) wavelengths is the standard process for patterning 90-nm state-of-the-art devices in the semiconductor industry, and extensions to 45 nm and below are currently being explored. With such high resolution, the inherent high throughput of optical lithography will enable the development of a broad range of applications beyond semiconductor electronics. In this article, we will review progress toward nanopatterning with UV light in a variety of materials and geometries.The common thread is the use of short wavelengths, 193 nm or 157 nm, coupled with immersion to further reduce the effective wavelength. Densely spaced, 32-nm (and even smaller) features have been patterned, facilitating the future preparation of large-area, deeply scaled microelectronics, nanophotonics, nanobiology, and molecular-scale self-assembly.

Keywords

nanoscaleoptical lithography.
Type
Research Article
Information
MRS Bulletin , Volume 30 , Issue 12: Fabrication of Sub-45-nm Device Structures , December 2005 , pp. 942 - 946
Copyright
Copyright © Materials Research Society 2005

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