Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Chantngarm, Peerasak
2008.
Characterization of structures maskless-etched by low-energy FIB.
p.
1716.
Gnaser, Hubert
Reuscher, Bernhard
and
Brodyanski, Alexander
2008.
Focused ion beam implantation of Ga in nanocrystalline diamond: Fluence-dependent retention and sputtering.
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms,
Vol. 266,
Issue. 8,
p.
1666.
Gnaser, Hubert
Brodyanski, Alexander
and
Reuscher, Bernhard
2008.
Focused ion beam implantation of Ga in Si and Ge: fluence‐dependent retention and surface morphology.
Surface and Interface Analysis,
Vol. 40,
Issue. 11,
p.
1415.
Matovic, J.
Kettle, J.
Brousseau, E.
and
Adamovic, N.
2008.
Patterning of nanomembranes with a focused-ion-beam.
p.
103.
Gierak, Jacques
Bourhis, Eric
Mailly, Dominique
Patriarche, Gilles
Madouri, Ali
Jede, Ralf
Bauerdick, Sven
bruchhaus, lars
Hawkes, Peter
Biance, Anne-Laure
Schiedt, Birgitta
Auvray, Loïc
Bardotti, Laurent
Prevel, Brigitte
Mélinon, Pascal
Perez, Alain
Ferré, Jacques
Jamet, Jean Pierre
Mougin, Alexandra
Chappert, Claude
Mathet, Véronique
Aigouy, Lionel
Robert-Philip, Isabelle
Sagnes, Isabelle
Braive, Rémy
Beveratos, Alexios
and
Abram, Izo
2008.
Exploration of the Ultimate Patterning Potential Achievable with Focused Ion Beams.
MRS Proceedings,
Vol. 1089,
Issue. ,
Plank, H.
Dienstleder, M.
Kothleitner, G.
and
Hofer, F.
2008.
EMC 2008 14th European Microscopy Congress 1–5 September 2008, Aachen, Germany.
p.
683.
Utke, Ivo
Hoffmann, Patrik
and
Melngailis, John
2008.
Gas-assisted focused electron beam and ion beam processing and fabrication.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Vol. 26,
Issue. 4,
p.
1197.
Frimmer, Martin
Sun, Jie
Maximov, Ivan
and
Xu, H. Q.
2008.
Transport properties of three-terminal ballistic junctions realized by focused ion beam enhanced etching in InGaAs/InP.
Applied Physics Letters,
Vol. 93,
Issue. 13,
Gierak, J.
Bourhis, E.
Faini, G.
Patriarche, G.
Madouri, A.
Jede, R.
Bruchhaus, L.
Bauerdick, S.
Schiedt, B.
Biance, A.L.
and
Auvray, L.
2009.
Exploration of the ultimate patterning potential achievable with focused ion beams.
Ultramicroscopy,
Vol. 109,
Issue. 5,
p.
457.
Ebm, Christoph
and
Hobler, Gerhard
2009.
Assessment of approximations for efficient topography simulation of ion beam processes: 10keV Ar on Si.
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms,
Vol. 267,
Issue. 18,
p.
2987.
MoberlyChan, Warren J
2009.
Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures.
Journal of Physics: Condensed Matter,
Vol. 21,
Issue. 22,
p.
224013.
Chantngarm, Peerasak
2009.
An analysis of a quasi-one-dimensional structure fabricated by low-energy focused ion beam.
p.
1.
Munroe, P.R.
2009.
The application of focused ion beam microscopy in the material sciences.
Materials Characterization,
Vol. 60,
Issue. 1,
p.
2.
Grechishkin, R. M.
Il’yashenko, S. V.
Istomin, V. V.
Kalashnikov, V. S.
Koledov, V. V.
Kuchin, D. S.
Lega, P. V.
Luchinin, V. V.
Perov, E. P.
Savenko, A. Yu.
Shavrov, V. G.
and
Shelyakov, A. V.
2009.
Two-way shape memory in a nanoscale sample of Ti49.5Ni25.5Cu25.0 alloy with a partially ordered structure.
Bulletin of the Russian Academy of Sciences: Physics,
Vol. 73,
Issue. 8,
p.
1076.
McLeod, Euan
and
Arnold, Craig B.
2009.
Array-based optical nanolithography using optically trapped microlenses.
Optics Express,
Vol. 17,
Issue. 5,
p.
3640.
Ali, Mohammad Yeakub
Hung, Wayne
and
Yongqi, Fu
2010.
A review of focused ion beam sputtering.
International Journal of Precision Engineering and Manufacturing,
Vol. 11,
Issue. 1,
p.
157.
VanDevender, A.
Colombe, Y.
Amini, J.
Leibfried, D.
and
Wineland, D.
2010.
Efficient Fiber Optic Detection of Trapped Ion Fluorescence.
Physical Review Letters,
Vol. 105,
Issue. 2,
Ebm, Christoph
Hobler, Gerhard
Waid, Simon
and
Wanzenboeck, Heinz D.
2010.
Modeling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena,
Vol. 28,
Issue. 5,
p.
946.
Zhao, J.
Lu, K.
Chen, B.
and
Tian, Z.
2010.
Processing of Nanoparticle Materials and Nanostructured Films.
Vol. 223,
Issue. ,
p.
47.
Cho, Jeong-Hyun
Azam, Anum
and
Gracias, David H.
2010.
Three Dimensional Nanofabrication Using Surface Forces.
Langmuir,
Vol. 26,
Issue. 21,
p.
16534.