Chemical Fluid Deposition Enables Conformal Coating of High-Aspect-Ratio Features in Si Wafers

Tim Palucka

doi:10.1557/mrs2001.269

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Chemical Fluid Deposition Enables Conformal Coating of High-Aspect-Ratio Features in Si Wafers

Published online by Cambridge University Press: 03 May 2012

Tim Palucka

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Type: Research/Researchers
Information: MRS Bulletin , Volume 26 , Issue 12: New Aspects in Nanocrystal Research , December 2001 , pp. 970

DOI: https://doi.org/10.1557/mrs2001.269 [Opens in a new window]
Copyright: Copyright © Materials Research Society 2001

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Chemical Fluid Deposition Enables Conformal Coating of High-Aspect-Ratio Features in Si Wafers

Volume 26, Issue 12
Tim Palucka
DOI: https://doi.org/10.1557/mrs2001.269

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Chemical Fluid Deposition Enables Conformal Coating of High-Aspect-Ratio Features in Si Wafers

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