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Chemical epitaxy of semiconductor thin films

Published online by Cambridge University Press:  31 January 2011

Anna Osherov  and
Yuval Golan
Anna Osherov
Affiliation:
Ben-Gurion University of the Negev, Beer-Sheva 84105, Israel, [email protected]
Yuval Golan
Affiliation:
Ben-Gurion University of the Negev, Beer-Sheva 84105, Israel, [email protected]
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Abstract

Epitaxial thin films of semiconductor materials are mostly formed on single crystal substrates using physical and chemical vapor phase deposition techniques. This article focuses on a much less common technique for synthesis of epitaxial thin films, chemical bath deposition (CBD) from solution, which offers a simple, inexpensive, and scalable alternative. One of the major advantages of CBD is in sequential processing, where low deposition temperatures help minimize interdiffusion. We outline the CBD pathway to epitaxial semiconductor films and provide examples for well-defined orientation relationships between film and substrate pairs in a variety of epitaxial systems. The influence of the chemical nature, structure, and orientation of the substrate on the incipient films is outlined, as well as the effect of parameters such as solution composition, bath temperature, and pH for controlling the film morphology and its consequent physical properties.

Type
Technical Feature
Information
MRS Bulletin , Volume 35 , Issue 10: Electrodeposition and Chemical Bath Deposition of Functional Nanomaterials , October 2010 , pp. 790 - 796
Copyright
Copyright © Materials Research Society 2010

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