Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Pyeon, Jung Joon
Cho, Cheol Jin
Jeong, Doo Seok
Kim, Jin-Sang
Kang, Chong-Yun
and
Kim, Seong Keun
2018.
A Ru–Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors.
Nanotechnology,
Vol. 29,
Issue. 45,
p.
455202.
Popovici, M.
Belmonte, A.
Oh, H.
Potoms, G.
Meersschaut, J.
Richard, O.
Hody, H.
Van Elshocht, S.
Delhougne, R.
Goux, L.
and
Kar, G. Sankar
2018.
High-performance (<tex>$\text{EOT} < 0.4\text{nm}$</tex>, Jg∼10−7 A/cm2) ALD-deposited Ru\SrTiO<inf>3</inf> stack for next generations DRAM pillar capacitor.
p.
2.7.1.
Hwang, Cheol Seong
and
Dieny, Bernard
2018.
Advanced memory—Materials for a new era of information technology.
MRS Bulletin,
Vol. 43,
Issue. 5,
p.
330.
Lee, Woongkyu
Cho, Cheol Jin
Lee, Woo Chul
Hwang, Cheol Seong
Chang, Robert P. H.
and
Kim, Seong Keun
2018.
MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitors.
Journal of Materials Chemistry C,
Vol. 6,
Issue. 48,
p.
13250.
Park, Min Hyuk
Lee, Young Hwan
Kim, Han Joon
Kim, Yu Jin
Moon, Taehwan
Kim, Keum Do
Hyun, Seung Dam
and
Hwang, Cheol Seong
2018.
Morphotropic Phase Boundary of Hf1–xZrxO2 Thin Films for Dynamic Random Access Memories.
ACS Applied Materials & Interfaces,
Vol. 10,
Issue. 49,
p.
42666.
Hsu, Wei-Heng
Bell, Roy
and
Victora, R. H.
2018.
Ultra-Low Write Energy Composite Free Layer Spin–Orbit Torque MRAM.
IEEE Transactions on Magnetics,
Vol. 54,
Issue. 11,
p.
1.
Han, Jin-Woo
Kim, Jungsik
Moon, Dong-Il
Lee, Jeong-Soo
and
Meyyappan, M.
2019.
Soft Error in Saddle Fin Based DRAM.
IEEE Electron Device Letters,
Vol. 40,
Issue. 4,
p.
494.
Paraskevas, Kyriakos
Attwood, Andrew
Luján, Mikel
and
Goodacre, John
2019.
Scaling the capacity of memory systems; evolution and key approaches.
p.
235.
Lee, Seung Won
Kim, Chang-Min
Choi, Jeong-Hun
Hyun, Cheol-Min
and
Ahn, Ji-Hoon
2019.
Modulation of crystal structure and electrical properties of Hf0.6Zr0.4O2 thin films by Al-doping.
Materials Letters,
Vol. 252,
Issue. ,
p.
56.
Kim, Sang Hyeon
Lee, Woongkyu
An, Cheol Hyun
Kim, Dong‐Gun
Kwon, Dae Seon
Cho, Seong Tak
Cha, Soon Hyung
Lim, Jun Il
and
Hwang, Cheol Seong
2019.
Effect of the Annealing Temperature of the Seed Layer on the Following Main Layer in Atomic‐Layer‐Deposited SrTiO3 Thin Films.
physica status solidi (RRL) – Rapid Research Letters,
Vol. 13,
Issue. 5,
Kozodaev, M. G.
Lebedinskii, Y. Y.
Chernikova, A. G.
Korostylev, E. V.
Chouprik, A. A.
Khakimov, R. R.
Markeev, Andrey M.
and
Hwang, C. S.
2019.
Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2.
The Journal of Chemical Physics,
Vol. 151,
Issue. 20,
Cho, Cheol Jin
Pyeon, Jung Joon
Hwang, Cheol Seong
Kim, Jin-Sang
and
Kim, Seong Keun
2019.
Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications.
Applied Surface Science,
Vol. 497,
Issue. ,
p.
143804.
Lee, Donghyun
Yang, Kun
Park, Ju-Yong
and
Park, Min Hyuk
2019.
Review of Electrical Characterization of Ceramic Thin Films for the Next Generation Semiconductor Devices.
Ceramist,
Vol. 22,
Issue. 4,
p.
332.
Park, Min Hyuk
and
Hwang, Cheol Seong
2019.
Fluorite-structure antiferroelectrics.
Reports on Progress in Physics,
Vol. 82,
Issue. 12,
p.
124502.
Das, Dipjyoti
and
Jeon, Sanghun
2020.
High-k HfxZr1-xO₂ Ferroelectric Insulator by Utilizing High Pressure Anneal.
IEEE Transactions on Electron Devices,
Vol. 67,
Issue. 6,
p.
2489.
Baek, Ji-Ye
Duy, Le Thai
Lee, Sang Yeon
and
Seo, Hyungtak
2020.
Aluminum doping for optimization of ultrathin and high-k dielectric layer based on SrTiO3.
Journal of Materials Science & Technology,
Vol. 42,
Issue. ,
p.
28.
Lee, Woo Chul
Kim, Sangtae
Larsen, Eric S.
Choi, Jung-Hae
Baek, Seung-Hyub
Lee, Minji
Cho, Deok-Yong
Lee, Han-Koo
Hwang, Cheol Seong
Bielawski, Christopher W.
and
Kim, Seong Keun
2020.
Atomic engineering of metastable BeO6 octahedra in a rocksalt framework.
Applied Surface Science,
Vol. 501,
Issue. ,
p.
144280.
Raza Ansari, Md. Hasan
Yoon Lee, Jae
Cho, Seongjae
and
Park, Byung-Gook
2020.
Design and Analysis of Core-Gate Shell-Chanel 1T DRAM.
p.
25.
Yoon, Young Jun
Lee, Jae Sang
Kim, Dong-Seok
Lee, Sang Ho
and
Kang, In Man
2020.
One-Transistor Dynamic Random-Access Memory Based on Gate-All-Around Junction-Less Field-Effect Transistor with a Si/SiGe Heterostructure.
Electronics,
Vol. 9,
Issue. 12,
p.
2134.
Ansari, Md. Hasan Raza
Navlakha, Nupur
Lee, Jae Yoon
and
Cho, Seongjae
2020.
Double-Gate Junctionless 1T DRAM With Physical Barriers for Retention Improvement.
IEEE Transactions on Electron Devices,
Vol. 67,
Issue. 4,
p.
1471.