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Chemical-Vapor-Deposited Materials for High Thermal Conductivity Applications

Published online by Cambridge University Press:  31 January 2011

Jitendra S. Goela ,
Nathaniel E. Brese ,
Michael A. Pickering  and
John E. Graebner
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Extract

Chemical vapor deposition (CVD) is an attractive method for producing bulk and thin-film materials for a variety of applications. In this method, gaseous reagents condense onto a substrate and then react to produce solid materials. The materials produced by CVD are theoretically dense, highly pure, and have other superior properties.

Type
Research Article
Information
MRS Bulletin , Volume 26 , Issue 6: High Thermal Conductivity Materials , June 2001 , pp. 458 - 463
Copyright
Copyright © Materials Research Society 2001

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