Hostname: page-component-78c5997874-s2hrs Total loading time: 0 Render date: 2024-11-19T15:20:05.805Z Has data issue: false hasContentIssue false
  • English
  • Français

Sounding out buried nanostructures using subsurface ultrasonic resonance force microscopy

Published online by Cambridge University Press:  02 February 2018

Maarten H. van Es ,
Abbas Mohtashami ,
Paul L.M.J. van Neer  and
Hamed Sadeghian
Maarten H. van Es*
Affiliation:
NOMI, Department of Optomechatronics, TNO, Stieltjesweg 1, 2628CK, Delft, The Netherlands
Abbas Mohtashami
Affiliation:
NOMI, Department of Optomechatronics, TNO, Stieltjesweg 1, 2628CK, Delft, The Netherlands
Paul L.M.J. van Neer
Affiliation:
NOMI, Department of Optomechatronics, TNO, Stieltjesweg 1, 2628CK, Delft, The Netherlands
Hamed Sadeghian
Affiliation:
NOMI, Department of Optomechatronics, TNO, Stieltjesweg 1, 2628CK, Delft, The Netherlands Department of Mechanical Engineering, Eindhoven University of Technology, Eindhoven, The Netherlands.
*
*(Email: [email protected])
Get access

Abstract

Imaging of nanoscale structures buried in a covering material is an extremely challenging task, but is also considered extremely important in a wide variety of fields. From fundamental research into the way living cells are built up to process control in semiconductor manufacturing would all benefit from the capability to image nanoscale structures through arbitrary covering layers. Combining Atomic Force Microscopy (AFM) with ultrasound has been shown a promising technology to enable such imaging in various configurations. Here we report the development of an alternative method of combining AFM with ultrasound which we call SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) and which is based on a combination of the two most common variants described in literature, which each have their specific strong points: Ultrasonic Force Microscopy (UFM) and Contact Resonance AFM (CR-AFM). We show the excellent performance of this combination on a number of samples designed specifically to mimic relevant conditions for the application as a metrology technique in the semiconductor manufacturing process. We also discuss the physics of the image contrast mechanism which is based on sensing local changes in visco-elastic properties of the sample bygenerating large indentations in the surface.

Keywords

scanning probe microscopy (SPM)viscoelasticitynanostructure
Type
Articles
Information
MRS Advances , Volume 3 , Issue 11: Theory, Characterization and Modeling , 2018 , pp. 603 - 608
Copyright
Copyright © Materials Research Society 2018 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Mohtashami, A, Navarro, V, Sadeghian, H, Englard, I, Shemesh, D, Malik, NS. In 33rd European Mask and Lithography Conference(Vol. 10446, p. 104460U). International Society for Optics and Photonics (2017).Google Scholar
Sadeghian, H, Herfst, R, Dekker, B, Winters, J, Bijnagte, T, Rijnbeek, R. Review of Scientific Instruments.;88(3):033703 (2017)Google Scholar
den Boef, A.J., Surf. Topogr. Metrol. Prop. 4 (2) 023001 (2016).Google Scholar
Bunday, B., in: SPIE Advanced Lithography, International Society for Optics and Photonics, p. 97780E (2016).Google Scholar
Verbiest, G., Oosterkamp, T., Rost, M., Nanotechnology (2016).Google Scholar
Killgore, J.P., Kelly, J.Y., Staffort, C.M., Fasolka, M.J., Hurley, D.C., Nanotechnology 22 175706 (2011).Google Scholar
Kolosov, O., Dinelli, F., Krier, A., Henini, M., Hayne, M., Pinque, P., in: Proceedings of Techcon- nectworld-2012, Nanotech-2012, 1, 2012, pp. 24–26 (2012).Google Scholar
Parlak, Z., Degertekin, F.L., J. Appl. Phys. 103 114910 (2008).CrossRefGoogle Scholar
Geer, R., Kolosov, O., Briggs, G., Shekhawat, G., J. Appl. Phys. 91(7) 4549–4555 (2002).Google Scholar
Rabe, U., Amelio, S., Kester, E., Scherer, V., Hirsekorn, S., Arnold, W., Ultrasonics 38 (1) 430–437 (2000).CrossRefGoogle Scholar
van Es, Maarten H., Mohtashami, Abbas, Thijssen, Rutger MT, Piras, Daniele, LMJ van Neer, Paul, and Sadeghian, Hamed, Ultramicroscopy 184: 209–216 (2018).Google Scholar
Yamanaka, K., Ogiso, H., Kolosov, O., Appl. Phys. Lett. 64(2) 178–180 (1994).CrossRefGoogle Scholar
Hertz, H. R., in Gesammelte Werke (Collected Works), Vol. 1, Leipzig, Germany, (1895).Google Scholar
Verbiest, G., Rost, M., Nat. Commun. 6:ncomms7444 (2015).Google Scholar