Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-22T15:12:12.677Z Has data issue: false hasContentIssue false
  • English
  • Français

In Situ Accurate Analysis of Colloidal Nanoparticles via Four Wave Mixing

Published online by Cambridge University Press:  02 January 2018

Jian Wu ,
Dao Xiang ,
Ching-Chung Hsueh ,
Jörg Rottler  and
Reuven Gordon
Jian Wu
Affiliation:
University of Victoria, Canada
Dao Xiang
Affiliation:
University of Victoria, Canada
Ching-Chung Hsueh
Affiliation:
University of British Columbia, Canada
Jörg Rottler
Affiliation:
University of British Columbia, Canada
Reuven Gordon*
Affiliation:
University of Victoria, Canada
*
*(Email: [email protected])
Get access

Abstract

Four-wave mixing (FWM) is used to measure the vibrational modes of nanoparticles in solution. The vibrations give information about the particle size, material properties and shape. This method has been used for in-situ monitoring of the growth of nanoparticles with high accuracy, as confirmed by electron microscopy analysis. We observe a threshold in the FWM signal which we believe is from a cavity forming around the nanoparticles that reduces viscous damping. We have observed this effect in molecular dynamics simulations as well.

Keywords

colloidacousticnanostructure
Type
Articles
Information
MRS Advances , Volume 3 , Issue 14: Nanomaterials , 2018 , pp. 707 - 709
Check for updates
Copyright
Copyright © Materials Research Society 2017 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

Wheaton, S., Gelfand, R. M. and Gordon, R., Nat. Photon. 9, 68 (2015).Google Scholar
Kotnala, A., Wheaton, S. and Gordon, R., Nanoscale 7, 2295 (2015).Google Scholar
Smith, P. W., Ashkin, A. and Tomlinson, W. J., Opt. Lett. 6 284 (1981).Google Scholar
Wu, J., Xiang, D. and Gordon, R., Anal. Chem. 89, 2196 (2017).Google Scholar
Wu, J., Xiang, D., Hajisalem, G., Lin, F.C., Huang, J.S. and Gordon, R., Opt. Exp. 24, 23747 (2016).Google Scholar
Wu, J., Xiang, D. and Gordon, R., Opt. Exp. 24, 12458 (2016).Google Scholar
Xiang, D., Wu, J., Rottler, J. and Gordon, R., Nano Lett. 16, 3638 (2016).Google Scholar
Xiang, D. and Gordon, R., ACS Photon. 3, 1421 (2016).Google Scholar