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Fabrication and Morphological Control of a Palladium Film with a Three-Dimensional Nano-Network Structure as a Hydrogen Gas Sensing Material using Organic Acid Chelation

Published online by Cambridge University Press:  01 February 2019

Takuji Ube*
Affiliation:
Tokyo University of Science, Department of Materials Science and Technology
Akizumi Kawamoto
Affiliation:
Tokyo University of Science, Department of Materials Science and Technology
Tomoya Nishi
Affiliation:
Tokyo University of Science, Department of Materials Science and Technology
Takashi Ishiguro
Affiliation:
Tokyo University of Science, Department of Materials Science and Technology
*
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Abstract

Nano-porous palladium (Pd) thin films could potentially be applied to hydrogen gas sensing materials with high sensitivity and selectivity. In our previous study, a nano-porous Pd film was fabricated with a three-dimensional network structure from an AlPd mother alloy film by a dealloying method using the chelating ability of an organic acid. This process was simple and environmentally friendly because it only required organic acid in a ppm concentration, and did not exhaust a strong acid waste solution, including heavy metal ions. This method was modified to improve the Pd purity of the dealloyed specimen, reaction rate, and morphology control. In this study, the existence of a composition undulation pattern was shown in the AlPd mother alloy film, and its effects on the morphology of the dealloyed specimen were evaluated. Furthermore, this pattern could be controlled by N2 gas addition to the Ar sputtering gas during the preparation of the AlPd mother alloy film.

Type
Articles
Copyright
Copyright © Materials Research Society 2019 

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References

References:

Wittstock, A., Zielasek, V., Biener, J., Friend, C.M. and Bäumer, M., Science 327, 319 (2010).CrossRefGoogle Scholar
Luc, W. and Jiao, F., ACS Catalysis 7, 5856 (2017).CrossRefGoogle Scholar
Li, Z., Lin, S., Ji, L., Zhang, Z., Zhang, X. and Ding, Y., Catal. Sci. Technol. 4, 1734 (2014).CrossRefGoogle Scholar
Qiu, H.J., Li, X., Xu, H.-T., Zhang, H.-J. and Wang, Y., J. Mater. Chem. C 2, 9788 (2014).CrossRefGoogle Scholar
Yim, C., Lee, M., Yun, M., Kim, G.-H., Kim, K.T. and Jeon, S., Sci. Rep. 5, 10674 (2015).CrossRefGoogle Scholar
Yamauchi, M., Ikeda, R., Kitagawa, H. and Takata, M., The Journal of Physical Chemistry C 112, 3294 (2008).CrossRefGoogle Scholar
Erlebacher, J., Aziz, M.J., Karma, A., Dimitrov, N. and Sieradzki, K., Nature 410, 450 (2001).CrossRefGoogle Scholar
Hakamada, M. and Mabuchi, M., Crit. Rev. Solid State Mater. Sci. 38, 262 (2013).CrossRefGoogle Scholar
Zhang, Z., Wang, Y., Qi, Z., Zhang, W., Qin, J. and Frenzel, J., The Journal of Physical Chemistry C 113, 12629 (2009).CrossRefGoogle Scholar
Harumoto, T., Tamura, Y. and Ishiguro, T., AIP Adv. 5, 017146 (2015).CrossRefGoogle Scholar
Ube, T., Kawamoto, A., Nishi, T. and Ishiguro, T., (unpublished).Google Scholar
Nishi, T., Ube, T. and Ishiguro, T., (unpublished).Google Scholar
Ellner, M., Kattner, U. and Predel, B., Journal of the Less Common Metals 87, 117 (1982).CrossRefGoogle Scholar
Ellner, M., Journal of the Less Common Metals 60, P15 (1978).CrossRefGoogle Scholar
Yurechko, M., Fattah, A., Velikanova, T. and Grushko, B., J. Alloys Compd. 329, 173 (2001).CrossRefGoogle Scholar
Guisbiers, G., Abudukelimu, G. and Hourlier, D., Nanoscale Research Letters 6, 396 (2011).CrossRefGoogle Scholar