Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-29T16:05:33.114Z Has data issue: false hasContentIssue false
  • English
  • Français

UV excimer laser produced plasma and it's application to laser plasma switching

Published online by Cambridge University Press:  09 March 2009

Qihong Lou
Qihong Lou
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 8211, Shanghai, China
Get access Rights & Permissions [Opens in a new window]

Abstract

The characteristics of a laser plasma created by a high intensity UV excimer laser were investigated. The UV laser plasma was used as a switch for control of the laser pulse duration for the first time. An X-ray preionized XeCl laser pulse duration can be changed from 10 to 85 ns. This technique is useful for many applications of excimer lasers requiring various pulse durations.

Type
Research Article
Information
Laser and Particle Beams , Volume 6 , Issue 2 , May 1988 , pp. 335 - 341
Copyright
Copyright © Cambridge University Press 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Beterov, I. M. et al. 1985, Optics Communications, 54, 100.CrossRefGoogle Scholar
Konov, V. I. 1982, Akad. Nauk, SSSR, 46, 1044.Google Scholar
Lou, Q. & Wang, R. 1987, Optics and Laser Technology, 19, 33.CrossRefGoogle Scholar
Nikolaus, B. & Basting, D. 1986, Laser Magazine, 2, 28.Google Scholar
Rosen, D. I. et al. 1982, J. Appl. Phys., 53, 3190.CrossRefGoogle Scholar