Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-19T15:19:44.176Z Has data issue: false hasContentIssue false
  • English
  • Français

Time evolution of the two-dimensional expansion velocity distributions of the cathode plasma in pulsed high-power diodes

Published online by Cambridge University Press:  01 February 2013

Jie Yang ,
Ting Shu  and
Yuwei Fan
Jie Yang*
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Ting Shu
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Yuwei Fan
Affiliation:
College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
*
Address correspondence and reprint requests to: Jie Yang, College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha 410073, People's Republic of China. E-mail: [email protected]
Get access Rights & Permissions [Opens in a new window]

Abstract

A combination of electrical and optical diagnostics has been used to investigate the time evolution of the two-dimensional expansion velocity distributions of the cathode plasma in pulsed high-power diodes. The perveance model based on the Child-Langmuir law was used to calculate the expansion velocity of the diode plasmas from voltage and current profiles. Additionally, a four-channel high speed framing camera was used to observe the formation and subsequent movement of the cathode plasma. More accurate and valuable information about the dynamics of the cathode plasma was also acquired by utilizing the digital image processing methods. Results from the experiments and theoretical analysis were compared. In this paper, the experiments have been performed using a high-voltage pulse generator with 200 kV output voltage and 110 ns pulse duration. Current densities up to 440 A/cm2 were produced. The observation of the cathode plasma expansion in transverse direction indicated that the diode current was cathode-limited in the current rising stage (the first 60 ns of the current pulse). The perveance model should be modified taking in account the time dependent expanding plasma surface (i.e., not the whole cathode surface) for this period. The velocity in the direction parallel to the cathode surface (transverse velocity) was much larger than that in the direction perpendicular to the cathode surface (longitudinal velocity), and further, it dropped from 90 cm/μs to nearly 20 cm/μs rapidly. It was shown that, during the current flattop stage, the plasma filled out all the surface of cathode and the diode current was space-charge-limited. The values of the transverse velocity and longitudinal velocity were nearly the same and decreased relatively slowly. The satisfactory coincidence of experimental and calculated (both were in the range of 6–8 cm/μs) values of the cathode plasma expansion velocities was obtained.

Keywords

Cold cathode plasmaExpansion velocityHigh-power microwave devicesOptical diagnostics
Type
Research Article
Information
Laser and Particle Beams , Volume 31 , Issue 1 , March 2013 , pp. 129 - 134
Copyright
Copyright © Cambridge University Press 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Beilis, I.I. (1995). Theoretical modeling of cathode spot phenomena. In Handbook of Vacuum Arc Science and Technology (Boxman, R.L. and Martin, P.J., eds.), pp. 208–256. New Jersey: Noyes Publications.Google Scholar
Beilis, I.I. (2001). State of the theory of vacuum arcs. IEEE Trans. Plasma Sci. 29 657–670.CrossRefGoogle Scholar
Beilis, I.I. (2007). Laser plasma generation and plasma interaction with ablative target. Laser Part. Beams 25, 53–63.CrossRefGoogle Scholar
Beilis, I.I. & Keidar, M. (2000). Theoretical study of plasma expansion and electrical charaxteristics in the high-current vacuum arc. IEEE XIXth International Symposium on Discharges and Electrical Insulation in Vacuum Xi'an 1, 206–209.CrossRefGoogle Scholar
Benford, J., Swegle, J.A. & Schamiloglu, E. (2007). High Power Microwaves. New York: Taylor and Francis.CrossRefGoogle Scholar
Chang, C., Liu, G.Z., Fang, J.Y., Tang, C.X., Huang, H.J., Chen, C.H., Zhang, Q.Y., Liang, T.Z., Zhu, X.X. & Li, J.W. (2010). Field distribution, HPM multipactor, and plasma discharge on the periodic triangular surface. Laser Part. Beams 28, 185–193.CrossRefGoogle Scholar
Child, C.D. (1911). Discharge from hot CaO. Physical Review (Series I) 32, 492–511.CrossRefGoogle Scholar
Dong, C., Wu, A., Hao, S., Zou, J., Liu, Z., Zhang, P., Zhang, A., Xu, T., Chen, J., Xu, J., Liu, Q. & Zhou, Z. (2003). Surface treatment by high current pulsed electron beam. Surf. Coat. Technol. 163, 620–624.CrossRefGoogle Scholar
Fan, Y.W., Zhong, H., Li, Z., Yuan, C.W., Shu, T., Yang, H., Wang, Y. & Luo, L. (2011). Investigation of a 1.2-GHz magnetically insulated transmission line oscillator. IEEE Trans. Plasma Sci. 39, 540–544.CrossRefGoogle Scholar
Fan, Y.W., Zhong, H.H., Yang, H.W., Li, Z.Q., Shu, T., Zhang, J., Wang, Y. & Luo, L. (2008). Analysis and improvement of an X-band magnetically insulated transmission line oscillator. J. Appl. Phys. 103, 123301.CrossRefGoogle Scholar
Krasik, Y.E., Dunaevsky, A. & Felsteiner, J. (2001). Plasma sources for high-current electron beam generation. Phys. Plasmas 8, 2466.CrossRefGoogle Scholar
Krasik, Y.E., Gleizer, J.Z., Yarmolich, D., Vekselman, V., Hadas, Y. & Felsteiner, J. (2008). Plasma emission sources for high-current electron beam generation. IEEE Trans. Plasma Sci. 36, 768–777.CrossRefGoogle Scholar
Krasik, Y.E., Gleizer, J.Z., Yarmolich, D., Vekselman, V., Hadas, Y., Krokhmal, A., Chirko, K., Peleg, O. & Felsteiner, J. (2007). Passive and active plasma emission sources for high-current electron beam generation. IEEJ Trans. Fundamentals and Materials 127, 697.CrossRefGoogle Scholar
Krasik, Y.E., Yarmolich, D., Gleizer, J.Z., Vekselman, V., Hadas, Y., Gurovich, V.T. & Felsteiner, J. (2009). Pulsed electron sources. Phys. Plasmas 16, 057103.CrossRefGoogle Scholar
Langmuir, I. (1913). The effect of space charge and residual gases on thermionic currents in high vacuum. Physical Review 2, 450–486.CrossRefGoogle Scholar
Mesyats, G.A. (2000). Cathode Phenomena in a Vacuum Discharge: The Breakdown, the Spark and the Arc. Moscow: Nauka.Google Scholar
Miller, R.B. (1982). An Introduction to the Physics of Intense Charged Particle Beams. New York: Plenum.CrossRefGoogle Scholar
Miller, R.B. (1998). Mechanism of explosive electron emission for dielectric fiber (velvet) cathode. J. Appl. Phys. 84, 3880–3889.CrossRefGoogle Scholar
Pushkarev, A.I. & Sazonov, R.V. (2009). Research of cathode plasma speed in planar diode with explosive emission cathode. IEEE Trans. jPlasma Sci. 37, 1901–1907.CrossRefGoogle Scholar
Roth, R. (1995). Industrial Plasma Engineering, Bristol, U.K: Inst. Phys. Publ.Google Scholar
Roy, A., Menon, R., Mitra, S., Kumar, S., Sharma, V., Nagesh, K.V., Mittal, K.C. & Chakravarthy, D.P. (2009). Plasma expansion and fast gap closure in a high power electron beam diode. Phys. Plasma 16, 053103.CrossRefGoogle Scholar
Saveliev, Y.M., Sibbett, W. & Parkes, D.M. (2002). Perveance of a planar diode with explosive emission finite-diameter cathodes. Appl. Phys. Lett. 81, 2343–2345.CrossRefGoogle Scholar
Saveliev, Y.M., Sibbett, W. & Parkes, D.M. (2003). Current conduction and plasma distribution on dielectric (velvet) explosive emission cathodes J. Appl. Phys. 94, 7416–7421.CrossRefGoogle Scholar
Shiffler, D., Haworth, M., Cartwright, K., Umstattd, R., Ruebush, M., Heidger, S., Lacour, M., Golby, K., Sullivan, D., Duselis, P. & Luginsland, J. (2008). Review of cold cathode research at the airforce research laboratory. IEEE Trans. Plasma Sci. 36, 718–728.CrossRefGoogle Scholar
Wang, T., Qian, B.L., Zhang, J.D., Zhang, X.P., Cao, Y.B. & Zhang, Q. (2011). Preliminary experimental investigation of a dual-band relativistic backward wave oscillator with dual beams. Phys. Plasmas 18, 013107.Google Scholar
Xiao, R.Z., Zhang, X.W., Zhang, L.J., Li, X.Z., Zhang, L.G., Song, W., Hu, Y.M., Sun, J., Huo, S.F., Chen, C.H., Zhang, Q.Y. & Liu, G.Z. (2010). Efficient generation of multi-gigawatt power by a klystron-like relativistic backward wave oscillator. Laser Part. Beams 28, 505–511.CrossRefGoogle Scholar
Yang, J., Shu, T., Fan, Y.W. & Zhang, J. (2012a). Time-resolved plasma characteristics in a short-pulse high-power diode with a dielectric fiber (velvet) cathode. IEEE Trans. Plasma Sci. 40, 1696–1700.CrossRefGoogle Scholar
Yang, J., Shu, T., Zhang, J., Yang, J.H., Liu, L., Yin, Y., Fan, Y.W. & Luo, L. (2012b). Investigation of synchronous trigger for time-resolved optical diagnostic system in intense electron beam diode. High Power Laser Part. Beams 24, 963–967.CrossRefGoogle Scholar
Zhang, J., Jin, Z.X., Yang, J.H., Zhong, H.H., Shu, T., Zhang, J.D., Qian, B.L., Yuan, C.W., Li, Z.Q., Fan, Y.W., Zhou, S.Y. & Xu, L.R. (2011). Recent advance in long-pulse HPM sources with repetitive operation in S-, C-, and X-Bands. IEEE Trans. Plasma Sci. 39, 1438–1445.CrossRefGoogle Scholar
Zhou, C.T., Yu, M.Y. & He, X.T. (2007). Electron acceleration by high current-density relativistic electron bunch in plasmas. Laser Part. Beams 25, 313–319.CrossRefGoogle Scholar
Zhu, J., Shu, T., Zhang, J., Li, G.L. & Zhang, Z.H. (2010). A high power Ka band millimeter wave generator with low guiding magnetic field. Phys. Plasmas 17, 083104.Google Scholar