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Temporal measurements of extreme ultraviolet (EUV) emission, from low temperature, EUV-induced plasmas

Published online by Cambridge University Press:  31 August 2018

A. Bartnik ,
H. Fiedorowicz ,
P. Wachulak  and
T. Fok
A. Bartnik*
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
H. Fiedorowicz
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
P. Wachulak
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
T. Fok
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
*
Author for correspondence: A. Bartnik, Institute of Optoelectronics, Military University of Technology, Warsaw, Poland. E-mail: [email protected]
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Abstract

In this work, extreme ultraviolet (EUV) emission, from EUV induced, low-temperature microplasmas, were investigated. To perform temporal measurements of the EUV pulses of low intensity, in a medium vacuum, under the pressure of the order of 0.1–0.01 mbar a special detection system was prepared. The system was based on an EUV collector and a semiconductor detector, sensitive for the EUV photons. The collector consisted of two identical grazing incidence, paraboloidal mirrors, and allowed to focus a part of the radiation emitted from the microplasma onto the detector surface. An absorption filter, mounted between the collector and the detector, allowed for selection of an interesting wavelength range. Plasmas were created by irradiation of small portions of gases, injected into the vacuum chamber, using a laser produced plasma EUV source. Three gases were used for the EUV induced plasma formation: neon, krypton, and xenon. Low-temperature plasmas, created in these gases, contained multiply charged ions, emitting radiation in similar wavelength ranges. Two detectors, AXUV20HS1 and AXUVHS5, were used for the measurements. It was shown that differences between the corresponding signal profiles, obtained using both detectors, were not very significant. Moreover, it was demonstrated that the duration of the EUV emission from plasmas, created in different gases, were comparable with the duration of the driving EUV pulse. The longest EUV emission was observed for Kr plasmas, approximately 1.5 times the full width half maximum of the driving EUV pulse.

Keywords

EUV detectorsEUV opticsEUV sourcelaser-produced plasma
Type
Research Article
Information
Laser and Particle Beams , Volume 36 , Issue 3 , September 2018 , pp. 286 - 292
Copyright
Copyright © Cambridge University Press 2018 

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References

Abrikosov, A, Reshetnyak, V, Astakhov, D, Dolgov, A, Yakushev, O, Lopaev, D and Krivtsun, V (2017) Numerical simulations based on probe measurements in EUV-induced hydrogen plasma. Plasma Sources Science and Technology 26, 045011.Google Scholar
Bartnik, A (2015) Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter (Review). Optoelectronics Review 23, 172–186.Google Scholar
Bartnik, A, Fiedorowicz, H, Jarocki, R, Kostecki, J, Rakowski, R and Szczurek, M (2008) EUV emission from solids illuminated with a laser-plasma EUV source. Applied Physics B: Photophysics and Laser Chemistry 93, 737.Google Scholar
Bartnik, A, Pisarczyk, T, Wachulak, P, Chodukowski, T, Fok, T, Wegrzynski, L, Kalinowska, Z, Fiedorowicz, H, Jarocki, R, Szczurek, M, Krousky, E, Pfeifer, M, Skala, J, Ullschmied, J, Dostal, J, Dudzak, R, Hrebícek, J, Medrik, T, Cikhardt, J, Cikhardtova, B, Klir, D, Rezac, K and Pina, L (2015) Photoionized plasmas in laboratory: a connection to astrophysics and planetary sciences. Proc. of SPIE 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV, 95100P.Google Scholar
Bartnik, A, Wachulak, P, Fiedorowicz, H and Skrzeczanowski, W (2016) Kr photoionized plasma induced by intense EUV pulses. Physics of Plasmas 23, 043512.Google Scholar
Bartnik, A, Skrzeczanowski, W, Wachulak, P, Saber, I, Fiedorowicz, H, Fok, T and Węgrzyński, L (2017) Low-temperature photoionized plasmas induced in Xe gas using an EUV source driven by nanosecond laser pulses. Laser and Particle Beams 35, 42–47.Google Scholar
Bartnik, A, Skrzeczanowski, W, Fiedorowicz, H, Wachulak, P and Fok, T (2018) Low-temperature plasmas induced in nitrogen by extreme ultraviolet (EUV) pulses. Laser and Particle Beams 36, 76–83.Google Scholar
Chalupský, J, Boháček, P, Burian, T, Hájková, V, Hau-Riege, SP, Heimann, PA, Juha, L, Messerschmidt, M, Moeller, SP, Nagler, B, Rowen, M, Schlotter, WF, Swiggers, ML, Turner, JJ and Krzywinski, J (2015) Imprinting a Focused X-Ray Laser Beam to Measure Its Full Spatial Characteristics. Physical Review Applied 4, 014004.Google Scholar
Gerasimova, N, Dziarzhytski, S, Weigelt, H, Chalupský, J, Hájková, V, Vyšín, L and Juha, L (2013) In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source. Review of Scientific Instruments 84, 065104.Google Scholar
Huang, Z (2013) Brightness and coherence of synchrotron radiation and fels. Proceedings of the 4th International Particle Accelerator Conference, 16–20. Zhimin Dai, Christine Petit-Jean-Genaz, Volker R.W. Schaa, Chuang Zhang, Editors.Google Scholar
Könneckea, R, Follath, R, Pontius, N, Schlappa, J, Eggenstein, F, Zeschke, T, Bischoff, P, Schmidt, J-S, Nolla, T, Trabanta, C, Schreck, S, Wernet, Ph, Eisebitt, S, Senf, F, Schüßler-Langeheine, C, Erko, A and Föhlisch, A (2013) The confocal plane grating spectrometer at BESSY II. Journal of Electron Spectroscopy and Related Phenomena 188, 133–139.Google Scholar
Seely, JF, Boyer, CN, Holland, GE and Weaver, JL (2002) X-ray absolute calibration of the time response of a silicon photodiode. Applied Optics 41, 5209–5217.Google Scholar
van der Horst, RM, Beckers, J, Osorio, EA, Astakhov, DI, Goedheer, WJ, Lee, CJ, Ivanov, VV, Krivtsum, VM, Koshelev, KN, Lopaev, DV, Bijkerk, F and Banine, VY (2016) Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen. Journal of Physics D: Applied Physics 49, 145203.Google Scholar