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Simultaneous stimulated Raman forward and backward scattering in hot, well-underdense plasmas

Published online by Cambridge University Press:  09 March 2009

S. J. Karttunen  and
R. R. E. Salomaa
S. J. Karttunen
Affiliation:
Technical Research Centre of Finland, Nuclear Engineering Laboratory P.O. Box 169, SF-00181 Helsinki, Finland
R. R. E. Salomaa
Affiliation:
Helsinki University of Technology, Department of Technical Physics, SF-02150 Espoo, Finland
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Abstract

The competition of stimulated Raman forward scattering and backscattering in a hightemperature, underdense, nearly homogeneous plasma slab is investigated. In such plasmas Landau damping limits the growth of the Raman backscattering, and the weaker forward process may reach comparable levels. A modest seeding of one of the scattered electromagnetic waves influences the competition to a large extent. The conversion of the pump wave to scattered waves is calculated. The simultaneous operation of the two processes can lead to considerable modifications in the electron distribution; e.g., two hot tail components are formed because the plasma waves involved have different phase velocities. The generation regions of the scattering processes are spatially separated. Consequently, a large number of thermal electrons can be accelerated to very high energies in two stages. The backward plasmons preaccelerate the electrons and the faster plasmons, excited in the forward scattering, operate as a booster.

Type
Research Article
Information
Laser and Particle Beams , Volume 10 , Issue 1 , March 1992 , pp. 75 - 89
Copyright
Copyright © Cambridge University Press 1992

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