Hostname: page-component-586b7cd67f-tf8b9 Total loading time: 0 Render date: 2024-11-26T21:06:26.087Z Has data issue: false hasContentIssue false
  • English
  • Français

Phase transformation under beam-target interactions during high-intensity pulsed ion beam irradiation at low pressure

Published online by Cambridge University Press:  21 June 2011

X.P. Zhu ,
F.G. Zhang ,
Y. Tang  and
M.K. Lei
X.P. Zhu
Affiliation:
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
F.G. Zhang
Affiliation:
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
Y. Tang
Affiliation:
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
M.K. Lei*
Affiliation:
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
*
Address correspondence and reprint requests to: M.K. Lei, Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China. E-mail: [email protected]
Get access Rights & Permissions [Opens in a new window]

Abstract

Nitrides and/or carbonitrides formation of high efficiency was found on titanium target under irradiation of high-intensity pulsed ion beam (HIPIB) with a few shots at a low pressure of 10−2 Pa order, which is extraordinary in comparison with conventional thermo-chemical diffusion process such as gas nitriding and/or carbonitriding of metals necessarily heated at high temperatures during a processing time of hours. The underlying mechanism of the nitrides and carbonitrides formation on titanium targets was explored by a comparative study on three typical HIPIB sources, i.e., TEMP-6, TEMP-4M, and ETIGO-II, varying the irradiation intensity within several J/cm2 per shot of a 60–70 ns pulse duration and the shot number of similar ion species. It is revealed that ambient gases and ion source material are the main sources providing the nitrogen and carbon species for the phase transformation on titanium target at the low pressures, whereas the ion species of HIPIB composition is negligible at a low implantation dose of 1013–1014 ions/cm2. The adsorbed gaseous species, the deposited layer of the ion source material, and in-situ formed compound top layer from reactions between ablation plasma and the ambient species during HIPIB irradiation, can be effectively incorporated into the irradiated target surfaces under a controlled HIPIB-target interaction.

Keywords

CarbonitridingHigh-intensity pulsed ion beamIrradiationNitridingPhase transformation
Type
Research Article
Information
Laser and Particle Beams , Volume 29 , Issue 3 , September 2011 , pp. 283 - 289
Copyright
Copyright © Cambridge University Press 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Bell, T. (1992). Surface treatment and coating of PM components. Mater. Des. 13, 139–144.CrossRefGoogle Scholar
Bystritskii, V., Garate, E., Grigoriev, V., Kharlov, A., Lavernia, E. & Peng, X. (1999). The high power pulsed ion beam mixing of a titanium layer with an aluminum substrate. Nucl. Instrum. Methods Phys. Res. B 149, 61–66.CrossRefGoogle Scholar
Czerwiec, T., Renevier, N. & Michel, H. (2000). Low-temperature plasma-assisted nitriding. Surf. Coat. Technol. 131, 267–277.CrossRefGoogle Scholar
Davis, H.A., Remnev, G.E., Stinnett, R.W. & Yatsui, K. (1996). Intense ion-beam treatment of materials, MRS Bulletin 21, 58–62.CrossRefGoogle Scholar
Dong, Z.H., Zhang, Z., Liu, C., Zhu, X.P. & Lei, M.K. (2006). Droplets from the metal surfaces irradiated by a high-intensity pulsed ion beam. Appl. Surf. Sci. 253, 2557–2564.CrossRefGoogle Scholar
Hammerl, C., Renner, B., Rauschenbach, B. & Assmann, W. (1999) Phase formation in titanium after high-fluence oxygen ion implantation. Nucl. Instrum. Methods in Phys. Res. B 148, 851–857.CrossRefGoogle Scholar
Han, M., Lieb, K.-P., Carpene, E. & Schaaf, P. (2003) Laser-plume dynamics during excimer laser nitriding of iron. J. Appl. Phys. 93, 5742–5749.CrossRefGoogle Scholar
Hashimoto, Y. & Yatsuzuka, M. (2000). Study on smoothing of titanium surface by intense pulsed ion beam irradiation. Vacuum 59, 313–320.CrossRefGoogle Scholar
Lavrentiev, V., Hammerl, C., Rauschenbach, B. & Kukharenko, O. (2001). Formation of hardened surface layers in titanium under irradiation with intense ion beams. Scripta Mater. 44, 625–630.CrossRefGoogle Scholar
Lei, M.K., Zhang, Z.L. & Ma, T.C. (2000). Plasma-based low-energy ion implantation for low-temperature surface engineering. Surf. Coat. Technol. 131, 317–325.CrossRefGoogle Scholar
Manova, D., Gerlach, J.W., Neumann, H.Assmann, W. & Mändl, S. (2006). Phase formation in Ti after high fluence/high temperature nitrogen implantation. Nucl. Instrum. Methods Phys. Res. B 242, 282–284.CrossRefGoogle Scholar
Möller, W., Parascandola, S., Telbizova, T., Gunzel, R. & Richter, E. (2001). Surface processes and diffusion mechanisms of ion nitriding of stainless steel and aluminium. Surf. Coat. Technol. 136, 73–79.CrossRefGoogle Scholar
Remnev, G.E., Ivanov, Yu. F., Naiden, E.P., Saltymakov, M.S., Stepanov, A.V. & Shtanko, V.F. (2009). Formation of silicon carbide and diamond nanoparticles in the surface layer of a silicon target during short-pulse carbon ion implantation. Technical Phys. 54, 600–602.CrossRefGoogle Scholar
Schaaf, P. (2002). Laser nitriding of metals. Prog. Mater. Sci. 47, 1–161.CrossRefGoogle Scholar
Schaaf, P., Han, M., Lieb, K.-P. & Carpene, E. (2002). Laser nitriding of iron with laser pulses from femtosecond to nanosecond pulse duration. Appl. Phys. Lett. 80, 1901–1903.CrossRefGoogle Scholar
Sonegawa, T., Grigoriu, C., Masugata, K., Yastsui, K., Shimotori, Y.Furuuchi, S. & Yamamoto, H. (1996). Low-temperature preparation of BaTiO3 thin films by intense, pulsed, ion beam evaporation. Laser Part. Beams 14, 537–542.CrossRefGoogle Scholar
Stepanov, A.V. & Remnev, G.E. (2008). The magnetic field distribution in acceleration gap of magnetically insulated ion diode. Proc. 17th High-Power Part. Beams Conf., 423–426.Google Scholar
Tsyganov, I., Wieser, E., Matz, W., Mücklich, A., Reuther, H., Pham, M.T. & Richter, E. (2000). Phase formation in aluminium implanted titanium and the correlated modification of mechanical and corrosive properties. Thin Solid Films 376, 188–197.CrossRefGoogle Scholar
Wood, B.P., Perry, A.J., Bitteker, L.J. & Waganaar, W.J. (1998). Cratering behavior in single- and poly-crystalline copper irradiated by an intense pulsed ion beam. Surf. Coat. Technol. 108–109, 171–176.CrossRefGoogle Scholar
Xin, J.P., Zhu, X.P. & Lei, M.K. (2009). Significance of time-of-flight ion energy spectrum on energy deposition into matter by high-intensity pulsed ion beam. Laser Part. Beams 28, 429–436.CrossRefGoogle Scholar
Yatsui, K., Tokuchi, A., Tanaka, H., Ishizuka, H., Kawai, A., Sai, E., Masugata, K., Ito, M. & Matsui, M. (1985). Geometric focusing of intense pulsed ion beams from racetrack type magnetically insulated diodes. Laser Part. Beams 3, 119–155.CrossRefGoogle Scholar
Yatsui, K., Kang, X.D., Sonegawa, T., Matsuoka, T., Masugata, K., Shimotori, Y., Satoh, T., Furuuchi, S., Ohuchi, Y., Takeshita, T. & Yamamoto, H. (1994). Applications of intense pulsed ion beam to materials science. Phys. Plasmas 1, 1730–1737.CrossRefGoogle Scholar
Zhu, X.P., Lei, M.K., Dong, Z.H. & Ma, T.C. (2003). Characterization of a high-intensity unipolar-mode pulsed ion source with improved magnetically insulated diode. Rev. Sci. Instrum. 74, 47–52.CrossRefGoogle Scholar
Zhu, X.P., Suematsu, H., Jiang, W., Yatsui, K. & Lei, M.K. (2005). Pulsed-ion-beam nitriding and smoothing of titanium surface in a vacuum. Appl. Phys. Lett. 87, 093111.CrossRefGoogle Scholar
Zhu, X.P., Dong, Z.H., Han, X.G., Xin, J.P. & Lei, M.K. (2007). Lifetime of anode polymer in magnetically insulated ion diodes for high-intensity pulsed ion beam generation. Rev. Sci. Instrum. 78, 023301.CrossRefGoogle ScholarPubMed