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Laser–induced film deposition by LIFT: Physical mechanisms and applications

Published online by Cambridge University Press:  08 June 2006

V.P. VEIKO ,
E.A. SHAKHNO ,
V.N. SMIRNOV ,
A.M. MIASKOVSKI  and
G.D. NIKISHIN
V.P. VEIKO
Affiliation:
Laser Applications Engineering and Applied Ecology Department, St. Petersburg State University of Information Technologies, Mechanics, and Optics, St. Petersburg, Russia
E.A. SHAKHNO
Affiliation:
Laser Applications Engineering and Applied Ecology Department, St. Petersburg State University of Information Technologies, Mechanics, and Optics, St. Petersburg, Russia
V.N. SMIRNOV
Affiliation:
Laser Applications Engineering and Applied Ecology Department, St. Petersburg State University of Information Technologies, Mechanics, and Optics, St. Petersburg, Russia
A.M. MIASKOVSKI
Affiliation:
Laser Applications Engineering and Applied Ecology Department, St. Petersburg State University of Information Technologies, Mechanics, and Optics, St. Petersburg, Russia
G.D. NIKISHIN
Affiliation:
Laser Applications Engineering and Applied Ecology Department, St. Petersburg State University of Information Technologies, Mechanics, and Optics, St. Petersburg, Russia
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Abstract

Peculiarities of the technique of the laser-induced film transfer (LIFT) are investigated. Possible mechanisms of tearing-off and transference of the films from the donor substrate (target) to the acceptor one are investigated. The main fields of LIFT applications are considered. One of the most interesting directions of LIFT applications—decontamination of radioactive surfaces—is investigated in detail. The main peculiarities and regimes of the processing are defined.

Keywords

AblationDeactivationFilmSubstrateTransfer
Type
Research Article
Information
Laser and Particle Beams , Volume 24 , Issue 2 , June 2006 , pp. 203 - 209
Copyright
© 2006 Cambridge University Press

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