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Theory and numerical solutions for sheath growth in a low-pressure plasma

Published online by Cambridge University Press:  13 March 2009

A. G. Jack ,
K. F. Sander  and
R. H. Varey
A. G. Jack
Affiliation:
Cambridge UniversityEngineering Department
K. F. Sander
Affiliation:
Cambridge UniversityEngineering Department
R. H. Varey
Affiliation:
Central Electricity Generating Board, Marchwood
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Extract

The theory of the development of thick sheaths given in an earlier paper (Sander 1969) is applied to planar sheath growth in practical situations. The results are compared with those resulting from a purely numerical method and from certain approximate equations suggested by other workers in the field.

Type
Articles
Information
Journal of Plasma Physics , Volume 5 , Issue 2 , March 1971 , pp. 211 - 224
Copyright
Copyright © Cambridge University Press 1971

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References

REFERENCES

Birdsall, C. K. & Bridges, W. B. 1966 Electron Dynamics of Diode Regions. New York: Academic Press.Google Scholar
Bohm, D. 1949 The Characteristics of Electrical Discharges in Magnetic Fields (edited by Guthrie, A. & Wakening, R. K.). New York: McGraw-Hill.Google Scholar
Chester, J. K. 1967 Private communication. See also (1970) J. Sci. Techn. 37, 2.Google Scholar
Koch, W. 1936 Z. Tech. Phys. 17, 446.Google Scholar
Memdelev, B. G. & Svyatoezerskaya, 1951 J. Tech. Phys. U.S.S.R. 21, 18.Google Scholar
Sander, K. F. 1969 J. Plasma Phys. 3, 353.CrossRefGoogle Scholar
Varey, R. H. & Sander, K. F. 1969 J. Phys. D. 3, 541.CrossRefGoogle Scholar