Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-23T19:13:27.252Z Has data issue: false hasContentIssue false
  • English
  • Français

Saturation-power enhancement of a free-electron laser amplifier through parameters adjustment

Published online by Cambridge University Press:  24 February 2015

Yu-Pin Ji ,
Y.-G. Xu ,
S.-J. Wang ,
J.-Y. Xu ,
X.-X. Liu  and
S.-C. Zhang
Yu-Pin Ji
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China
Y.-G. Xu
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China
S.-J. Wang
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China
J.-Y. Xu
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China
X.-X. Liu
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China
S.-C. Zhang*
Affiliation:
School of Physics and Chemistry, Xihua University, Chengdu SC610039, P. R. of China Institute of Photoelectronics, Southwest Jiaotong University, Chengdu SC610031, P. R. of China
*
†Email address for correspondence: [email protected]
Get access Rights & Permissions [Opens in a new window]

Abstract

Saturation-power enhancement of a free-electron laser (FEL) amplifier by using tapered wiggler amplitude is based on the postponement of the saturation length of the uniform wiggler. In this paper, we qualitatively and quantitatively demonstrate that the saturation-power enhancement can be approached by means of the parameters adjustment, which is comparable to that by using a tapered wiggler. Compared to the method by tapering the wiggler amplitude, the method of parameters adjustment substantially shortens the saturation length, which is favorable to cutting down the manufacture and operation costs of the device.

Type
Research Article
Information
Journal of Plasma Physics , Volume 81 , Issue 3 , June 2015 , 905810317
Check for updates
Copyright
Copyright © Cambridge University Press 2015 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Asgekar, V.et al. 2012 Rev. Scientific Instrum. 83, 015 116.CrossRefGoogle Scholar
Bahman, F. and Maraghechi, B. 2012 Phys. Plasmas 19, 013 107.CrossRefGoogle Scholar
Dattoli, G.et al. 2012 Phys. Rev. ST Accel. Beams 15, 030 708.CrossRefGoogle Scholar
Freund, H. and Miner, W. Jr. 2009 J. Appl. Phys. 105, 113 106.CrossRefGoogle Scholar
Giannessi, L.et al. 2011 Phys. Rev. Lett. 106, 144 801.CrossRefGoogle Scholar
Ji, Y.-P., Wang, S.-J., Xu, J.-Y., Xu, Y.-G., Liu, X.-X., Lu, H., Huang, X.-L. and Zhang, S.-C. 2014 Chin. Phys. B 23, 024 103.CrossRefGoogle Scholar
Jiao, Y.et al. 2012 Phys. Rev. ST Accel. Beams 15, 050 704.CrossRefGoogle Scholar
Kroll, N., Morton, P. and Rosenbluth, M. 1981 IEEE J. Quantum Electron. 17, 1436.CrossRefGoogle Scholar
Martin, I. and Bartolini, R. 2011 Phys. Rev. ST Accel. Beams 14, 030 702.CrossRefGoogle Scholar
Orzechowski, T.et al. 1986 Phys. Rev. Lett. 57, 2172.CrossRefGoogle Scholar
Saldin, E., Schneidmiller, E. and Yurkov, M. 2000 The Physics of Free Electron Lasers. Berlin: Springer-Verlag.CrossRefGoogle Scholar
Sprangle, P., Tang, C.-T. and Manheimer, W. 1979 Phys. Rev. Lett. 43, 1932.CrossRefGoogle Scholar
Wang, X.et al. 2009 Phys. Rev. Lett. 103, 154 801.CrossRefGoogle Scholar