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Measurement of ion-rich sheath thickness by ion acoustic wave

Published online by Cambridge University Press:  13 March 2009

S. Watanabe ,
O. Ishihara  and
H. Tanaca
S. Watanabe
Affiliation:
Institute of Materials Science and Engineering, Yokohama National University, Yokohama, Japan
O. Ishihara
Affiliation:
Institute of Materials Science and Engineering, Yokohama National University, Yokohama, Japan
H. Tanaca
Affiliation:
Institute of Materials Science and Engineering, Yokohama National University, Yokohama, Japan
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Abstract

Measurements of sheath thickness in a low-pressure plasma are reported. The sheath is ion-rich and contains both ions and electrons; the sheath edge is taken as a boundary for ion acoustic waves. The thickness of the sheath is estimated from a frequency shift of the wave. Despite the actually continuous transition from plasma to sheath, a clear-cut sheath edge is observed. It should be emphasized that even a very small increase in thickness, such as 0·1mm, can be measured by this frequency-analysis method. The experimentally obtained sheath boundary is in agreement with the Tonks–Langmuir value as modified by Self.

Type
Research Article
Information
Journal of Plasma Physics , Volume 8 , Issue 3 , December 1972 , pp. 321 - 330
Copyright
Copyright © Cambridge University Press 1972

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References

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