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Low-frequency instability excited by a mesh grid in a double-plasma device

Published online by Cambridge University Press:  13 March 2009

J. Chutia ,
S. Sato ,
H. Kubo  and
Y. Nakamura
J. Chutia
Affiliation:
Institute of Space and Astronautical Science, Yoshinodai, Sagamihara, Kanagawa 229, Japan
S. Sato
Affiliation:
Institute of Space and Astronautical Science, Yoshinodai, Sagamihara, Kanagawa 229, Japan
H. Kubo
Affiliation:
Institute of Space and Astronautical Science, Yoshinodai, Sagamihara, Kanagawa 229, Japan
Y. Nakamura
Affiliation:
Institute of Space and Astronautical Science, Yoshinodai, Sagamihara, Kanagawa 229, Japan
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Abstract

Coherent low-frequency oscillations whose frequency is lower than the ion plasma frequency are generated by a mesh grid with negative d.c. bias in a double-plasma device. The frequency is inversely proportional to the one-quarter power of the grid voltage under a fixed plasma density, and is proportional to the ion plasma frequency when the grid bias is kept constant. With potential profiles near the grid, which are measured by an emissive probe, the transit time of ions is numerically calculated. The inverse of the transit time agrees well with the oscillation frequency. The oscillation is considered to be excited by a klystron bunching effect of incident ions towards the ion-rich sheaths.

Type
Research Article
Information
Journal of Plasma Physics , Volume 46 , Issue 3 , December 1991 , pp. 463 - 471
Copyright
Copyright © Cambridge University Press 1991

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References

REFERENCES

Atwater, H. A. 1962 Introduction to Microwave Theory, p. 155. McGraw-Hill.Google Scholar
Barrett, P. J. & Greaves, R. G. 1989 Phys. Fluids B 1, 1776.CrossRefGoogle Scholar
Buragohain, A., Chutia, J. & Nakamura, Y. 1991 Phys. Lett. A.Google Scholar
Cho, M. H., Hershkowitz, N. & Intrator, T. 1988 J. Vac. Sci. Technol. A 6, 2978.CrossRefGoogle Scholar
Gabl, E. F. & Lonngren, K. E. 1984 Plasma Phys. Contr. Fusion 26, 799.CrossRefGoogle Scholar
Honzawa, T. 1984 Phys. Fluids 27, 1013.CrossRefGoogle Scholar
Nakamura, Y. & Chutia, J. 1989 J. Plasma Phys. 41, 243.CrossRefGoogle Scholar
Nakamura, Y., Chutia, J. & Sato, S. 1989 Proceedings of International Conference on Plasma Physics, New Delhi, vol. 3, p. 949. Indian Academy of Sciences.Google Scholar
Nakamura, Y., Nomura, Y. & Itoh, T. 1980 Proceedings of International Conference on Plasma Physics, vol.1 119. Fusion Association of Japan.Google Scholar
Ohno, N., Komori, A., Tanaka, M. & Kawai, Y. 1991 Phys. Fluids B 3, 228.CrossRefGoogle Scholar
Popa, G. & Oertl, M. 1983 Phys. Lett. 98 A, 110.CrossRefGoogle Scholar
Schott, L. 1986 Phys. Fluids 29, 846.CrossRefGoogle Scholar
Schott, L. 1991 Phys. Fluids B 3, 236.CrossRefGoogle Scholar
Smith, J. R., Hershkowitz, N. & Coakley, P. 1979 Rev. Sci. Instrum. 50, 210.CrossRefGoogle Scholar
Watanabe, S., Ishihara, O. & Tanaka, H. 1972 J. Plasma Phys. 8, 321.CrossRefGoogle Scholar