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Influence of ion temperature on plasma sheath transition

Published online by Cambridge University Press:  13 October 2009

HAMID GHOMI
Affiliation:
Laser and Plasma Research Institute, Shahid Beheshti University, Evin 1983963113, Tehran, Iran ([email protected])
MANSOUR KHORAMABADI
Affiliation:
Plasma Physics Research Center, Science and Research Campus of Islamic Azad University, P.O. Box: 14665-678, Tehran, Iran ([email protected])

Abstract

Using a two-fluid model, the ion transition from plasma sheath boundary is investigated taking into account the effect of the finite ion temperature. It is shown that by considering the effects of neutral-ion elastic collision on the sheath, there will be an upper as well as a lower limit for the ion transition velocity into the sheath. The dependency of upper and lower limits of the ion transition velocity on the ion temperature is investigated, and it is shown that the finite ion temperature only affects lower limits in non-hot plasmas.

Type
Papers
Copyright
Copyright © Cambridge University Press 2009

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References

[1]Chen, F. F. 1974 Introduction to Plasma Physics. New York: Plenum, p. 244.Google Scholar
[2]Chen, X. P. 1998 Phys. Plasma 5, 804.CrossRefGoogle Scholar
[3]Bohm, D. In: The Characteristics of Electrical Discharges in Magnetic Fields (ed. Guthrie, A. and Wakerling, R.). New York: McGraw Hill, p. 194.Google Scholar
[4]Das, G. C., Singha, B. and Chutia, J. 1999 Phys. Plasmas 6, 3685.CrossRefGoogle Scholar
[5]Franklin, R. N. and Snell, J. 1999 J. Phys. D 32, 2190.CrossRefGoogle Scholar
[6]Franklin, R. N. and Snell, J. 2000 Phys. Plasmas 7, 3077.CrossRefGoogle Scholar
[7]Franklin., R. N. and Snell, J. 2001 Phys. Plasmas 8, 643.CrossRefGoogle Scholar
[8]Franklin, R. N. 2002 J. Phys. D 35, 2270.CrossRefGoogle Scholar
[9]Kaganovich, I. D. 2002 Phys. Plasmas 9, 4788.CrossRefGoogle Scholar
[10]Liu, J. Y., Wang, Z. X. and Wang, X. 2003 Phys. Plasmas 10, 3032.CrossRefGoogle Scholar
[11]Lei, M., Zhang, Y., Ding, W., Liu, J. and Wang, X. 2006 Plasma science & Technology 8, 544.Google Scholar
[12]Alterkop, B. 2004 J. Appl. Phys. 95, 1650.CrossRefGoogle Scholar