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YBCO film growth on ultrathin Ag layers

Published online by Cambridge University Press:  03 March 2011

C. Zhong ,
S.T. Ruggiero ,
R. Fletcher  and
E. Moser
C. Zhong
Affiliation:
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
S.T. Ruggiero
Affiliation:
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
R. Fletcher
Affiliation:
Wright Laboratory, Materials Directorate, Wright-Patterson Air Force Base, Dayton, Ohio 45433
E. Moser
Affiliation:
Wright Laboratory, Materials Directorate, Wright-Patterson Air Force Base, Dayton, Ohio 45433
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Abstract

We discuss our results on the growth of YBCO thin films on ultrathin (1-10 nm) Ag underlayers. Substrates were LaAlO3. YBCO was sputter deposited and Ag thermally evaporated. It was observed that Tc remained relatively unaffected by the Ag underlayers, ranging from 86-88 K. Critical currents were found to be consistent with YBCO grown on bulk Ag when the Ag underlayer film reached complete coverage (∼9 nm). Films grown on Ag showed a marked tendency for microcrystalline growth on the basis of atomic-force microscopy (AFM) results.

Type
Articles
Information
Journal of Materials Research , Volume 9 , Issue 11 , November 1994 , pp. 2761 - 2763
Copyright
Copyright © Materials Research Society 1994

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References

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