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Transmission electron microscopy study of Co/Pd and Co/Au multilayers

Published online by Cambridge University Press:  31 January 2011

F. Hakkens ,
A. De Veirman ,
W. Coene  and
Broeder F.J.A. den
F. Hakkens
Affiliation:
Philips Research Laboratories, P.O. Box 80000, 5600 JA Eindhoven, The Netherlands
A. De Veirman
Affiliation:
Philips Research Laboratories, P.O. Box 80000, 5600 JA Eindhoven, The Netherlands
W. Coene
Affiliation:
Philips Research Laboratories, P.O. Box 80000, 5600 JA Eindhoven, The Netherlands
Broeder F.J.A. den
Affiliation:
Philips Research Laboratories, P.O. Box 80000, 5600 JA Eindhoven, The Netherlands
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Abstract

The structure of Co/Pd and Co/Au (111) multilayers is studied using transmission electron microscopy and high resolution electron microscopy. We focused on microstructure, atomic stacking (especially at the interfaces), and coherency, as these are structural properties that have considerable magnetic effects. A columnar structure with a strong curvature of the multilayer influenced by substrate temperature during growth is observed. High resolution imaging shows numerous steps at the interfaces of the multilayer structure and the presence of misfit dislocations. In bright-field images, periodic contrast fringes are observed at these interfaces as the result of moiré interference. These moiré fringes are used to study the misfit relaxation at the interfaces, whereas electron diffraction gives the average relaxation over the whole layer. Both measurements determined that, for Co/Pd as well as Co/Au multilayers, 80–85% of the misfit is relaxed and 20–15% remains in the form of strain, independent of the Co layer thickness in the regime studied.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 5 , May 1993 , pp. 1019 - 1027
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1Carcia, P.F.Meinhaldt, A.D. and Suna, A.Appl. Phys. Lett. 47, 178 (1985).CrossRefGoogle Scholar
2Carcia, P.F.J. Appl. Phys. 63, 5066 (1988).CrossRefGoogle Scholar
3Broeder, F. J. A. den, Kuiper, D.Mosselaer, A. P. and Hoving, W.Phys. Rev. Lett. 60, 2769 (1988).Google Scholar
4Draaisma, H.J. G.Jonge, W.J. M. de, and Broeder, F. J. A. den, J. Magn. Magn. Mater. 66, 351 (1987).CrossRefGoogle Scholar
5Neel, L.J. Phys. Rad. 15, 225 (1954).Google Scholar
6Chappert, C. and Bruno, P.J. Appl. Phys. 64, 5736 (1988).CrossRefGoogle Scholar
7Clarke, R.Elagoz, S.Vavra, W.Schuler, E. and Uher, C.J. Appl. Phys. 70, 5775 (1991).CrossRefGoogle Scholar
8England, C. D.Engel, B. N. and Falco, C. M.J. Appl. Phys. 69, 5310 (1991).CrossRefGoogle Scholar
9Davis, B.M.Li, D.X.Seidman, D.N.Ketterson, J.B.Bhadra, R. and Grimsditch, M.J. Mater. Res. 7, 1356 (1992).CrossRefGoogle Scholar
10Wall, M.A. and Jankowski, A.F.Thin Solid Films 181, 313 (1989).CrossRefGoogle Scholar
11Hakkens, F.Coene, W. and Broeder, F.J.A. den, in Magnetic Surfaces, Thin Films, and Multilayers, edited by Parkin, S. S. P.Hopster, H.Renard, J-P.Shinjo, T. and Zenn, W. (Mater. Res. Soc. Symp. Proc. 231, Pittsburgh, PA, 1992), p. 397.Google Scholar
12Broeder, F. J. A. den, Hoving, W. and Bloemen, P. J. H.J. Magn. Magn. Mater. 93, 562 (1991).Google Scholar
13Dirks, A. G.Wolters, R.A.M. and Veirman, A.E.M. De, Thin Solid Films 208, 181 (1992).CrossRefGoogle Scholar
14Schowalter, L. J. in Hetereoepitaxy on Silicon: Fundamentals, Structures, and Devices, edited by Choi, H.K.Hull, R.Ishiwara, H. and Nemanich, R. J. (Mater. Res. Soc. Symp. Proc. 116, Pittsburgh, PA, 1988), p. 3.Google Scholar
15Cohesion in Metals, edited by Boer, F. R. De, Boom, R.Mattens, W. C. M., Miedema, A. R. and Niessen, A. K. (North-Holland, Amsterdam, The Netherlands, 1988).Google Scholar
16Gao, Y.Shewmon, P.G. and Dregia, S. A.Acta Metall. 37, 3165 (1989).Google Scholar
17Matthews, J.W.Philos. Mag. 13, 1207 (1966).CrossRefGoogle Scholar
18Gao, Y. and Merkle, K.L.J. Mater. Res. 5, 1995 (1990).Google Scholar
19Cherns, D.Smith, D. A.Krakow, W. and Batson, P. E.Philos. Mag. A45, 107 (1982).Google Scholar
20Merwe, J. H. van der, in Single Crystal Films, edited by Francombe, M. H. and Sato, H. (Pergamon Press, Oxford, 1964), p. 139.Google Scholar
21Gilmore, C. M.Phys. Rev. B40, 6402 (1989).Google Scholar
22Tholen, A.R.Phys. Status Solidi A2, 537 (1970).Google Scholar
23Cherns, D. and Stowell, M.J.Thin Solid Films 29, 127 (1975).Google Scholar
24Macur, J.E. and Vook, R.W.Thin Solid Films 66, 311 (1980).Google Scholar