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Thin-film compound phase formation at Fe–Ge and Cr–Ge interfaces

Published online by Cambridge University Press:  31 January 2011

O. M. Ndwandwe
Affiliation:
Physics Department, University of Zululand, Kwa-Dlangezwa 3886, South Africa
C. C. Theron
Affiliation:
Materials Research Group, iThemba LABS, Somerset West 7129, South Africa
T. K. Marais
Affiliation:
Physics Department, University of the Western Cape, Bellville, 7535, South Africa
R. Pretorius
Affiliation:
Physics Department, University of Stellenbosch, Stellenbosch 7600, South Africa
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Abstract

Phase formation was studied in the Fe–Ge and Cr–Ge thin-film systems by means of Rutherford backscattering spectrometry and x-ray diffraction. In the Fe–Ge system, FeGe was the first phase to form while in the Cr–Ge system, Cr11Ge8 was found to form first. The results are compared with the predictions of the effective heat of formation model. Heats of formation were calculated using the Miedema model. The effect of the transformation enthalpy term ΔHtr, used to convert a semiconducting element into a hypothetical metallic one in the Miedema model, is also discussed.

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Articles
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

Wittmer, M., Nicolet, M-A., Mayer, J.W., Thin Solid Films 42, 51 (1977).Google Scholar
Marshal, E.D., Wu, C.S., Pai, C.S., Scott, D.M., and Lau, S.S., in Thin Films: The Relationship of Structures to Properties, edited by Aita, C.R. and SreeHarsha, K.S. (Mater. Res. Soc. Symp. 47, Pittsburgh, PA, 1985), pp. 162166.Google Scholar
Hsieh, Y.F. and Chen, L.J., Thin Solid Films 162, 295 (1988).Google Scholar
Hsieh, Y.F., Chen, L.J., Marshall, E.D., and Lau, S.S., Appl. Phys. Lett. 51, 1588 (1987).Google Scholar
Hsieh, Y.F., Chen, L.J., Marshall, E.D., and Lau, S.S., Thin Solid Films 162, 287 (1988).CrossRefGoogle Scholar
Hong, S.Q., Comrie, C.M., Russell, S.W., and Mayer, J.W., J. Appl. Phys. 70, 3655 (1991).CrossRefGoogle Scholar
Hsieh, Y.F. and Chen, L.J., J. Appl. Phys. 63, 1177 (1988).CrossRefGoogle Scholar
Grimaldi, M.G., Wielunski, L., Nicolet, M-A., Tu, K.N., Thin Solid Films 81, 207 (1981).Google Scholar
Ostling, M., Lundberg, N., and d’Heurle, F.M., Appl. Surf. Sci. 53, 126 (1991).CrossRefGoogle Scholar
Thomas, O., Delage, S., d’Heurle, F.M., and Scilla, G., Appl. Phys. Lett. 54, 228 (1989).CrossRefGoogle Scholar
Marais, T.K., Taylor, E., Ndwandwe, M., Spoelstra, B., and Pretorius, R., Nucl. Instrum. Methods. B 85, 183 (1994).Google Scholar
Pretorius, R., Marais, T.K., and Theron, C.C., Mater. Sci. Eng. R 10, 1 (1993).Google Scholar
Doolittle, L.R., Nucl. Instrum. Methods Phys. Res. B 9, 344 (1985).Google Scholar
Pearson’s Handbook of Crystallographic Data for Intermetallic Phases, 1st ed., edited by Villars, P. and Calvert, L.D. (American Society for Metals, Metal Park, OH, 1989).Google Scholar
Binary Alloy Phase Diagrams, 1st ed., edited by Massalski, T.B. (American Society for Metals, Metal Park, OH, 1986).Google Scholar
Miedema, A.R., Cha^tel, P.F. de, and Boer, F.R. de. Physica 100B, 1 (1980).Google Scholar