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Thermal regrowth of ion-damaged YBa2Cu3O7−δ superconducting thin films

Published online by Cambridge University Press:  31 January 2011

X.D. Wu
Affiliation:
Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
L. Luo
Affiliation:
Center for Materials Science, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
R.E. Muenchausen
Affiliation:
Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
S.R. Foltyn
Affiliation:
Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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Abstract

Regrowth of ion-damaged YBa2Cu3O7−δ thin films on LaAlO3 was studied using the ion beam channeling technique. The damaged films can be regrown at a temperature as low as 650 °C, and are stable up to 1000 °C. The regrowth process was found to be thermally activated with a single activation energy of 0.46 eV, contrary to two energies found in a previous study on the films on MgO [J. A. Martinez et al., Appl. Phys. Lett. 57, 189 (1990)].

Type
Communications
Copyright
Copyright © Materials Research Society 1992

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References

1.Martinez, J.A., Wilkens, B., Stoffel, N.G., Hart, D., Nazar, L., Venkatesan, T., Inam, A., and Wu, X.D., Appl. Phys. Lett. 57, 189 (1990).CrossRefGoogle Scholar
2.Hwang, D. M., Ravi, T. S., Ramesh, R., Chan, Sui Wai, Chen, C. Y.,Nazar, L., Wu, X. D., Inam, A., and Venkatesan, T.Appl. Phys. Lett. 57, 1690 (1990).CrossRefGoogle Scholar
3.Foltyn, S.R., Muenchausen, R.E., Dye, R.C., Wu, X.D., Luo, L., Cooke, D. W., and Taber, R. C., Appl. Phys. Lett. 59, 1374 (1991).CrossRefGoogle Scholar
4.Wu, X. D., Muenchausen, R. E., Foltyn, S., Estler, R. C., Dye, R. C., Garcia, A. R., Nogar, N. S., England, P., Ramesh, R., Hwang, D. M., Ravi, T. S., Chang, C. C., Xi, X. X., Li, Q., and Inam, A., Appl. Phys. Lett. 57, 523 (1990).CrossRefGoogle Scholar
5.Williams, J. S., in Surface Modification and Alloying by Laser, Ion and Electron Beams, edited by Poate, J. M., Foti, G., and Jacobson, D. C. (Plenum Press, New York, 1983), Chap. 5.Google Scholar