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Temperature dependence of positron annihilation in a Zr–Ti–Ni–Cu–Be bulk metallic glass

Published online by Cambridge University Press:  31 January 2011

Daewoong Suh
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305
Reinhold H. Dauskardt
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305
P. Asoka-Kumar
Affiliation:
Lawrence Livermore National Laboratory, Livermore, California 94550
Philip A. Sterne
Affiliation:
Lawrence Livermore National Laboratory, Livermore, California 94550
Richard H. Howell
Affiliation:
Lawrence Livermore National Laboratory, Livermore, California 94550
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Abstract

A strong temperature dependence of positron annihilation with low-momentum electrons is reported for a Zr-based bulk metallic glass in the temperature range 50–300 K. The observed behavior was rationalized in terms of shallow versus deep positron traps. An interpretation of the data was presented based on the idea that there were two different types of open-volume regions: Bernal interstitial sites and thermally unstable larger holes. Bernal interstitial sites, intrinsic to the glass structure, were found to be insensitive to annealing. Alternatively, the larger holes were removed by annealing. The strong correlation between these larger holes and diffusion and viscous flow processes suggests that they may act as diffusion and flow defects.

Type
Rapid Communications
Copyright
Copyright © Materials Research Society 2003

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