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Sputtered YBCO films on metal substrates

Published online by Cambridge University Press:  31 January 2011

E. Yin ,
M. Rubin  and
M. Dixon
E. Yin
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
M. Rubin
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
M. Dixon
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
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Abstract

Magnetron sputtering was used to deposit superconducting YBCO thin films on four polycrystalline metal substrates. Yttrium-stabilized zirconia (YSZ) and silver were used as buffer layers. The thermal expansion coefficient of the substrate was apparently correlated to the properties of the superconductor. Auger depth profiles showed that the YSZ buffer blocked diffusion of most metal elements from the substrate. Nevertheless, contamination of the films depressed Tc to 81 K on Hastelloy × from 87 K on single-crystal strontium titanate. The films on metal substrates were c-axis oriented, but with random rotation in the a-b plane and smaller grain size than epitaxial films on single crystals. The weak links from these factors restrict Jc to 104 A/cm2 at 40 K.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 7 , July 1992 , pp. 1636 - 1640
Copyright
Copyright © Materials Research Society 1992

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