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Sputter-deposition and characterization of paramelaconite

Published online by Cambridge University Press:  31 January 2011

K. J. Blobaum
Affiliation:
Department of Materials Science and Engineering, Johns Hopkins University, 3400 N. Charles St., Baltimore, Maryland 21218
D. Van Heerden
Affiliation:
Department of Materials Science and Engineering, Johns Hopkins University, 3400 N. Charles St., Baltimore, Maryland 21218
A. J. Wagner
Affiliation:
Department of Chemistry, Johns Hopkins University, 3400 N. Charles St., Baltimore, Maryland 21218
D. H. Fairbrother
Affiliation:
Department of Chemistry, Johns Hopkins University, 3400 N. Charles St., Baltimore, Maryland 21218
T. P. Weihs
Affiliation:
Department of Materials Science and Engineering, Johns Hopkins University, 3400 N. Charles St., Baltimore, Maryland 21218
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Abstract

While processing techniques for deposition of CuOx/Al multilayer foils were being developed, a method for synthesizing paramelaconite (Cu4O3) was serendipitously discovered. These paramelaconite films were successfully synthesized by sputter-deposition from a CuO target. Milligram quantities of uncontaminated material were produced enabling new studies of the morphology, stoichiometry, and thermodynamics of this unique copper oxide. At moderate temperatures, equiaxed paramelaconite grains deposited with a strong out-of-plane texture; at lower temperatures the paramelaconite grains showed no texture but were columnar in geometry. X-ray photoelectron spectroscopy showed that the as-deposited Cu4O3 had a nonstoichiometric Cu:O ratio of 1.7:1; the ratio of Cu+ to Cu2+ was 1.8:1. On heating, this phase decomposed into CuO and Cu2O at temperatures ranging from 400 to 530 °C. Using differential scanning calorimetry, the heat of formation and Gibbs free energy for Cu4O3 were estimated to be −453 and −279 kJ/mol, respectively. On the basis of these calculations and our observations, we confirmed that Cu4O3 is a metastable phase.

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Articles
Copyright
Copyright © Materials Research Society 2003

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