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Spectral fingerprinting of structural defects in plasma-treated carbon nanotubes

Published online by Cambridge University Press:  03 March 2011

Nirupama Chakrapani ,
Seamus Curran ,
Bingqing Wei ,
Pulickel M. Ajayan ,
Alvaro Carrillo  and
Ravi S. Kane
Nirupama Chakrapani*
Affiliation:
Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
Seamus Curran
Affiliation:
Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
Bingqing Wei
Affiliation:
Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
Pulickel M. Ajayan
Affiliation:
Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
Alvaro Carrillo
Affiliation:
Howard P. Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
Ravi S. Kane
Affiliation:
Howard P. Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Controlled introduction of defects into aligned multiwalled carbon nanotubes (MWCNTs) was achieved by time-dependent plasma etching. The subsequent morphological changes in MWCNTs have been fingerprinted using Raman and x-ray photoelectron spectroscopy, by which induction of defects by functionalization was confirmed. We found that the introduction of defects along the nanotube body affects all Raman vibrational modes. A systematic analysis of the relationship between D, D′, D*, and G modes leads us to believe that no one peak can be used as an accurate standard for estimation of defects in nanotubes.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 10 , October 2003 , pp. 2515 - 2521
Copyright
Copyright © Materials Research Society 2003

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