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Soft vacuum, pulsed electron-beam hardening of lithographic polymers

Published online by Cambridge University Press:  31 January 2011

J. Krishnaswamy ,
L. Li ,
G. J. Collins ,
H. Hiraoka  and
M. A. Caolo
J. Krishnaswamy
Affiliation:
Department of Electrical Engineering, Colorado State University, Fort Collins, Colorado 80523
L. Li
Affiliation:
Department of Electrical Engineering, Colorado State University, Fort Collins, Colorado 80523
G. J. Collins
Affiliation:
Department of Electrical Engineering, Colorado State University, Fort Collins, Colorado 80523
H. Hiraoka
Affiliation:
IBM Almaden Research Center, San Jose, California 95120-6099
M. A. Caolo
Affiliation:
Hewlett-Packard Company, Fort Collins, Colorado 80525
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Abstract

A 25 kV pulsed electron beam was used to harden 0.5−3.0μm thick AZ-type, MacDermid, and polyamic acid (PMDA + ODA) resist patterns. The resist profiles are stable against high-temperature treatment that ranges between 200−350 °C. The short pulse ∼ 100 ns, electron beams employed in resist hardening are produced from a cold cathode in 30−50 m Torr air by discharging energy stored in a 7.5 nF capacitor producing a dose/pulse ∼ 1μC/cm2 at the processed surface. Comparisons with conventional hardening methods using ultraviolet emission from a high-pressure mercury lamp, a windowless, vacuum ultraviolet (VUV) lamp, and low-energy electron emission from a cw source are also made.

Type
Articles
Information
Journal of Materials Research , Volume 3 , Issue 6 , December 1988 , pp. 1259 - 1267
Copyright
Copyright © Materials Research Society 1988

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References

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